Understanding the influence of sodium chloride concentration on ion diffusion in charged polymers von Bannon, Sean M., Kutner, Ethan, Garretson, Benjamin, Geise, Geoffrey M.

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SARS-CoV-2 Infection Depends on Cellular Heparan Sulfate and ACE2 von Clausen, Thomas Mandel, Sandoval, Daniel R., Spliid, Charlotte B., Pihl, Jessica, Perrett, Hailee R., Painter, Chelsea D., Narayanan, Anoop, Majowicz, Sydney A., Kwong, Elizabeth M., McVicar, Rachael N., Thacker, Bryan E., Glass, Charles A., Yang, Zhang, Torres, Jonathan L., Golden, Gregory J., Bartels, Phillip L., Porell, Ryan N., Garretson, Aaron F., Laubach, Logan, Feldman, Jared, Yin, Xin, Pu, Yuan, Hauser, Blake M., Caradonna, Timothy M., Kellman, Benjamin P., Martino, Cameron, Gordts, Philip L.S.M., Chanda, Sumit K., Schmidt, Aaron G., Godula, Kamil, Leibel, Sandra L., Jose, Joyce, Corbett, Kevin D., Ward, Andrew B., Carlin, Aaron F., Esko, Jeffrey D.

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Matrix-Insensitive Sensor Arrays via Peptide-Coated Nanoparticles: Rapid Saliva Screening for Pathogens in Oral and Respiratory Diseases von Lam, Benjamin, Amer, Lubna, Thompson, Elizabeth, Clark, Alex E., Garretson, Aaron F., Carlin, Aaron F., Chen, Casey, Retout, Maurice, Jokerst, Jesse V.

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Silver Nanoparticle Sensor Array for the Detection of SARS-CoV‑2 von Lam, Benjamin, Retout, Maurice, Clark, Alex E., Garretson, Aaron F., Carlin, Aaron F., Jokerst, Jesse V.

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Progressive Massive Choroidal Neovascularization: A Severe Phenotype of Refractory Neovascular Age-Related Macular Degeneration von Cheung, Albert Y., Rao, Prethy, Yonekawa, Yoshihiro, Thomas, Benjamin J., Shah, Aparna, Garretson, Bruce R., Capone, Antonio, Hassan, Tarek S.

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Control of processing parameters for substrate polishing with angularly distributed zones using cost function von Cherian, Benjamin, Garretson, Charles C, Brown, Brian J, Osterheld, Thomas H, Zhang, Huanbo, Lau, Eric, Zhu, Zhize

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CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH SUBSTRATE PRECESSION von LAU, Eric, OSTERHELD, Thomas H, BROWN, Brian J, ZHU, Zhize, CHERIAN, Benjamin, ZHANG, Huanbo, GARRETSON, Charles C

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CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH ANGULARLY DISTRIBUTED ZONES USING COST FUNCTION von Cherian, Benjamin, Garretson, Charles C, Brown, Brian J, Osterheld, Thomas H, Zhang, Huanbo, Lau, Eric, Zhu, Zhize

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CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH SUBSTRATE PRECESSION von Cherian, Benjamin, Garretson, Charles C, Brown, Brian J, Osterheld, Thomas H, Zhang, Huanbo, Lau, Eric, Zhu, Zhize

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Polishing system, computer program product and method for generating recipe for controlling same von ZHANG HONG, CHERIAN BENJAMIN, BROWN BRIAN J, ZHU, ZHAONING, OSTERHELD THOMAS H, GARRETSON CHARLES C, LAU ERIC

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기판 세차운동을 이용한 기판 연마를 위한 처리 파라미터들의 제어 von CHERIAN BENJAMIN, BROWN BRIAN J, OSTERHELD THOMAS H, ZHU ZHIZE, GARRETSON CHARLES C, LAU ERIC, ZHANG HUANBO

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Method, system and computer program product for control of processing parameters for substrate polishing with substrate precession von ZHANG, HUANBO, CHERIAN, BENJAMIN, ZHU, ZHI-ZE, OSTERHELD, THOMAS H, GARRETSON, CHARLES C, LAU, ERIC, BROWN, BRIAN J

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METHOD, SYSTEM AND COMPUTER PROGRAM PRODUCT FOR CONTROL OF PROCESSING PARAMETERS FOR SUBSTRATE POLISHING WITH SUBSTRATE PRECESSION von ZHANG, HUANBO, CHERIAN, BENJAMIN, OSTERHELD, THOMAS H, GARRETSON, CHARLES C, LAU, ERIC, ZHU, ZHIZE, BROWN, BRIAN J

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Control of processing parameters for substrate polishing with substrate precession von ZHANG, HUANBO, CHERIAN, BENJAMIN, ZHU, ZHI-ZE, OSTERHELD, THOMAS H, GARRETSON, CHARLES C, LAU, ERIC, BROWN, BRIAN J

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Control of process parameters for substrate polishing with substrate procession von ZHANG HONG, CHERIAN BENJAMIN, BROWN BRIAN J, ZHU, ZHAONING, OSTERHELD THOMAS H, GARRETSON CHARLES C, LAU ERIC

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Dynamic residue clearing control with in-situ profile control (ISPC) von DHANDAPANI SIVAKUMAR, CHERIAN BENJAMIN, OSTERHELD THOMAS H, GARRETSON CHARLES C, QIAN JUN

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DYNAMIC RESIDUE CLEARING CONTROL WITH IN-SITU PROFILE CONTROL (ISPC) von CHERIAN, BENJAMIN, OSTERHELD, THOMAS, H, QIAN, JUN, DHANDAPANI, SIVAKUMAR, GARRETSON, CHARLES, C

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DYNAMIC RESIDUE CLEARING CONTROL WITH IN-SITU PROFILE CONTROL (ISPC) von DHANDAPANI SIVAKUMAR, CHERIAN BENJAMIN, OSTERHELD THOMAS H, GARRETSON CHARLES C, QIAN JUN

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Dynamic residue clearing control with in-situ profile control (ispc) von CHERIAN, BENJAMIN, QIAN, JUN, DHANDAPANI, SIVAKUMAR, OSTERHELD, THOMAS H, GARRETSON, CHARLES C

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DYNAMIC RESIDUE CLEARING CONTROL WITH IN-SITU PROFILE CONTROL(ISPC) von DHANDAPANI SIVAKUMAR, CHERIAN BENJAMIN, OSTERHELD THOMAS H, GARRETSON CHARLES C, QIAN JUN

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