Exploring High-Temperature Reliability of 4H-SiC MOSFETs : A Comparative Study of High-K Gate Dielectric Materials von M. V. Ganeswara Rao, N. Ramanjaneyulu, Sumalatha Madugula, N. P. Dharani, K. Rajesh Babu, Kallepelli Sagar

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Retraction Note: Exploring High-Temperature Reliability of 4H-SiC MOSFETs: A Comparative Study of High-K Gate Dielectric Materials von Ganeswara Rao, M. V., Ramanjaneyulu, N., Madugula, Sumalatha, Dharani, N. P., Rajesh Babu, K., Sagar, Kallepelli

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Enhancing Performance of Dual-Gate FinFET with High-K Gate Dielectric Materials in 5 nm Technology: A Simulation Study von Rao, M. V. Ganeswara, Ramanjaneyulu, N., Pydi, Balamurali, Soma, Umamaheshwar, Babu, K. Rajesh, Prasad, Satti Harichandra

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RETRACTED ARTICLE: Exploring High-Temperature Reliability of 4H-SiC MOSFETs: A Comparative Study of High-K Gate Dielectric Materials von Ganeswara Rao, M. V., Ramanjaneyulu, N., Madugula, Sumalatha, Dharani, N. P., Rajesh Babu, K., Sagar, Kallepelli

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A New VLSI Architecture for Skin Tone Detection in an Uncontrolled Background von Ganeswara Rao, M. V., Panakala, Rajesh K., Mallikarjuna Prasad, A.

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High Performance and Flexible Data Path Architecture for DSP Applications von Naga Divya, D., Ganeswara Rao, M. V., Panakala, Rajesh K., Prasad, A. M.

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