Combining GeO2 passivation strategies aiming at dielectric layers with superior properties on germanium substrates von Louise Patron Etcheverry, Henri Ivanov Boudinov, Gabriel Vieira Soares, Radtke, Cláudio

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Timing of sulfur introduction in the sulfurization of WO3 films dictates WS2 formation von Schwendler Cabeda, Dheryck, Koszeniewski Rolim, Guilherme, Vieira Soares, Gabriel, Marcos Helgueira de Andrade, Antonio, Radtke, Cláudio

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The role of substrate on the growth of 2D heterostructures by CVD von Feijó, Taís Orestes, Copetti, Gabriela, Gerling, Ester Riedner Figini, Hanke, Michael, Lopes, João Marcelo J., Radtke, Cláudio, Soares, Gabriel Vieira

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Evolution of the Al2O3/Ge(100) interface for reactively sputter-deposited films submitted to postdeposition anneals von Bom, Nicolau Molina, Soares, Gabriel Vieira, Krug, Cristiano, Pezzi, Rafael Peretti, Baumvol, Israel Jacob Rabin, Radtke, Claudio

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Thermally driven hydrogen interaction with single-layer graphene on SiO2/Si substrates quantified by isotopic labeling von Feijó, Taís Orestes, Rolim, Guilherme Koszeniewski, Corrêa, Silma Alberton, Radtke, Cláudio, Soares, Gabriel Vieira

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Washing-resistant surfactant coated surface is able to inhibit pathogenic bacteria adhesion von TRETER, Janine, BONATTO, Fernando, KRUG, Cristiano, SOARES, Gabriel Vieira, RABIN BAUMVOL, Israel Jacob, MACEDO, Alexandre José

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Oxygen Transport and Incorporation in Pt/HfO 2 Stacks Deposited on Germanium and Silicon von Rolim, Guilherme Koszeniewski, Gobbi, Angelo, Soares, Gabriel Vieira, Radtke, Cláudio

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Chemical and morphological modifications of single layer graphene submitted to annealing in water vapor von Rolim, Guilherme Koszeniewski, Corrêa, Silma Alberton, Galves, Lauren Aranha, Lopes, João Marcelo J., Soares, Gabriel Vieira, Radtke, Cláudio

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Oxygen Transport and Incorporation in Pt/HfO2 Stacks Deposited on Germanium and Silicon von Rolim, Guilherme Koszeniewski, Gobbi, Angelo, Soares, Gabriel Vieira, Radtke, Cláudio

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Water Incorporation in Graphene Transferred onto SiO 2 /Si Investigated by Isotopic Labeling von Bom, Nicolau Molina, Soares, Gabriel Vieira, de Oliveira Junior, Myriano Henriques, Lopes, João Marcelo J., Riechert, Henning, Radtke, Cláudio

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Water Incorporation in Graphene Transferred onto SiO2/Si Investigated by Isotopic Labeling von Bom, Nicolau Molina, Soares, Gabriel Vieira, de Oliveira Junior, Myriano Henriques, Lopes, João Marcelo J, Riechert, Henning, Radtke, Cláudio

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Combining GeO 2 passivation strategies aiming at dielectric layers with superior properties on germanium substrates von Etcheverry, Louise Patron, Boudinov, Henri Ivanov, Vieira Soares, Gabriel, Radtke, Cláudio

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Combining GeO passivation strategies aiming at dielectric layers with superior properties on germanium substrates von Etcheverry, Louise Patron, Boudinov, Henri Ivanov, Vieira Soares, Gabriel, Radtke, Cláudio

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Effect of Plasma Nitriding Surface Modification on the Adhesion of Food Pathogens to Stainless Steel AISI 316 and AISI 304 von Casarin, Letícia Sopeña, de Oliveira Casarin, Fabrício, Soares, Tatiana Pacheco, Aguzzoli, Cesar, Figueroa, Carlos Alejandro, Soares, Gabriel Vieira, Brandelli, Adriano, Tondo, Eduardo Cesar

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SiO2/SiC Interfacial Region: Presence of Silicon Oxycarbides and Effects of Hydrogen Peroxide and Water Vapor Thermal Treatments von Corrêa, Silma A., Stedile, Fernanda Chiarello, Palmieri, Rodrigo, Radtke, Cláudio, Soares, Gabriel Vieira, Pitthan, Eduardo

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Hydrogen Interaction with HfO 2 Films Deposited on Ge(100) and Si(100) von Soares, Gabriel Vieira, Feijó, Taís, Baumvol, Israel J.R., Aguzzoli, Cesar, Krug, Cristiano, Radtke, Cláudio

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Improvement in the SiO2/4H-SiC Interfacial Region by Thermal Treatments with Hydrogen Peroxide von Corrêa, Silma A., Stedile, Fernanda Chiarello, Palmieri, Rodrigo, Boudinov, Henri I., Soares, Gabriel Vieira, Pitthan, Eduardo

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Interaction of Aluminum Oxide with Germanium during Thermal Annealing in Ar, N 2 /H 2 ,O 2 , or H 2 O von Radtke, Cláudio, Molina Bom, Nicolau, Vieira Soares, Gabriel, Krug, Cristiano, Jacob Rabin Baumvol, Israel

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Hydrogen Interaction with HfO2 Films Deposited on Ge(100) and Si(100) von Soares, Gabriel Vieira, Feijó, Taís, Baumvol, Israel J.R., Aguzzoli, Cesar, Krug, Cristiano, Radtke, Cláudio

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Zirconium nitride hard coatings von Roman, Daiane, De Amorim, Cintia Lugnani Gomes, Soares, Gabriel Vieira, Figueroa, Carlos Alejandro, Baumvol, Israel Jacob Rabin, Basso, Rodrigo Leonardo De Oliveira

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