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  1. 1
    POLYALLILOXYCARBONYLPENTENAMERS AS LIGHT-SENSITIVE SUBSTRATE OF PHOTORESISTOR

    POLYALLILOXYCARBONYLPENTENAMERS AS LIGHT-SENSITIVE SUBSTRATE OF PHOTORESISTOR von NEFEDOV OLEG M,SU, GASANOVA SABIRA S,SU, RAMAZANOV GAFAR A,SU, GULIEV ABASKULU M,SU, ALYEV ABDUL T,SU

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  2. 2
    POLYVINYL-ALKENYLCYCLOPROPYL CARBOXYLATES AS PHOTOSENSITIVE BASE FOR PHOTO- AND ELECTRONIC RESISTORS

    POLYVINYL-ALKENYLCYCLOPROPYL CARBOXYLATES AS PHOTOSENSITIVE BASE FOR PHOTO- AND ELECTRONIC RESISTORS von MUSINA ELMIRA A,SU, GASANOVA SABIRA S,SU, RAMAZANOV GAFAR A,SU, MOZZHUKHIN DMITRIJ D,SU, SELIVANOV GENNADIJ K,SU, AGAEV URFAT KH,SU, GULIEV ABASKULU M,SU, DENISKIN VIKTOR V,SU, ALYEV ABDUL T,SU

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