Positive-temperature-coefficient effect of electrical resistivity below melting point of poly(vinylidene fluoride) (PVDF) in Ni particle-dispersed PVDF composites von Kono, Akihiko, Shimizu, Katsuya, Nakano, Hajime, Goto, Yousuke, Kobayashi, Yusuke, Ougizawa, Toshiaki, Horibe, Hideo

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A high-speed photoresist removal process using multibubble microwave plasma under a mixture of multiphase plasma environment von Ishijima, Tatsuo, Nosaka, Kohei, Tanaka, Yasunori, Uesugi, Yoshihiko, Goto, Yousuke, Horibe, Hideo

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Removal of Ion-Implanted Photoresists Using Atomic Hydrogen von Yamamoto, Masashi, Maruoka, Takeshi, Goto, Yousuke, Kono, Akihiko, Horibe, Hideo, Sakamoto, Mune-aki, Kusano, Eiji, Seki, Hirofumi, Tagawa, Seiichi

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Estimation of activation energies for decomposition reaction of polymer by hydrogen radicals generated using hot-wire catalyzer von Kono, Akihiko, Arai, Yu, Goto, Yousuke, Yamamoto, Masashi, Takahashi, Seiji, Yamagishi, Tadaaki, Ishikawa, Kenji, Hori, Masaru, Horibe, Hideo

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Study of the decomposition mechanism of PMMA-type polymers by hydrogen radicals von Arai, Yu, Noto, Yusuke, Goto, Yousuke, Takahashi, Seiji, Yamamoto, Masashi, Nishiyama, Takashi, Kono, Akihiko, Ishijima, Tatsuo, Ishikawa, Kenji, Hori, Masaru, Horibe, Hideo

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Development of an Environmentally Friendly Resist-Removal Process Using Wet Ozone von Horibe, Hideo, Goto, Yousuke

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Removal of Ion-Implanted Photoresists Using Wet Ozone von Yamamoto, Masashi, Goto, Yousuke, Maruoka, Takeshi, Horibe, Hideo, Miura, Toshinori, Kusano, Eiji, Tagawa, Seiichi

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Reaction mechanism of polymer removal using wet ozone von Goto, Yousuke, Angata, Yukihiro, Tsukazaki, Emi, Takahashi, Seiji, Koike, Kunihiko, Yamagishi, Tadaaki, Horibe, Hideo

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Removal Characteristics of Resists Having Different Chemical Structures by Using Ozone and Water von Horibe, Hideo, Yamamoto, Masashi, Goto, Yousuke, Miura, Toshiinori, Tagawa, Seiichi

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Relationship between the Thermal Hardening of Ion-Implanted Resist and the Resist Removal Using Atomic Hydrogen von Maruoka, Takeshi, Goto, Yousuke, Yamamoto, Masashi, Horibe, Hideo, Kusano, Eiji, Takao, Kazuhisa, Tagawa, Seiichi

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Effect of cooling rate after polymer melting on electrical properties of high-density polyethylene Ni composites von Kono, Akihiko, Miyakawa, Naoko, Kawadai, Satoshi, Goto, Yousuke, Maruoka, Takeshi, Yamamoto, Masashi, Horibe, Hideo

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Removal of Ion-implanted Resists using High Concentration Wet Ozone von Goto, Yousuke, Angata, Yukihiro, Kono, Akihiko, Makihara, Naohisa, Koike, Kunihiko, Horibe, Hideo

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Resist Removal Method using Xe2 Excimer Ultraviolet Light von Kono, Akihiko, Goto, Yousuke, Angata, Yukihiro, Mizutani, Fumikazu, Horibe, Hideo

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Study of the Removal of Ion-Implanted Resists Using Wet Ozone von Goto, Yousuke, Angata, Yukihiro, Igarashi, Masanori, Yamamoto, Masashi, Nobuta, Takuya, Iida, Takayuki, Kono, Akihiko, Horibe, Hideo

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Removal of Ion Implanted Poly Vinyl Phenol using Wet Ozone von Goto, Yusuke, Angata, Yukihiro, Yamamoto, Masashi, Seki, Toshio, Matsumoto, Jiro, Horibe, Hideo

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Study of the Removal of Ion-Implanted Resists Using Wet Ozone von Goto, Yousuke, Angata, Yukihiro, Igarashi, Masanori, Yamamoto, Masashi, Nobuta, Takuya, Iida, Takayuki, Kono, Akihiko, Horibe, Hideo

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Removal of Polymers with Various Chemical Structures using Wet Ozone von Goto, Yousuke, Kitano, Kyoya, Maruoka, Takeshi, Yamamoto, Masashi, Konno, Akihiko, Horibe, Hideo, Tagawa, Seiichi

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Removal of Ion Implanted Resists with Various Acceleration Energy using Wet Ozone von Goto, Yousuke, Maruoka, Takeshi, Yamamoto, Masashi, Horibe, Hideo, Kusano, Eiji, Miura, Toshinori, Kekura, Mituru, Tagawa, Seiichi

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High removal rate of cross-linked SU-8 resist using hydrogen radicals generated by tungsten hot-wire catalyzer von Kono, Akihiko, Arai, Yu, Maruoka, Takeshi, Yamamoto, Masashi, Goto, Yousuke, Takahashi, Seiji, Nishiyama, Takashi, Horibe, Hideo

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Estimation of the Activation Energy of Resist Removal Using Wet Ozone von GOTO, Yousuke, FUNASAKA, Tomohiro, YAMAMOTO, Masashi, KOIKE, Kunihiko, HORIBE, Hideo

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