Fabrication and characterization of a nanogap edge emitter with a silicon-on-insulator wafer von Fujii, H, Kanemaru, S, Hiroshima, H, Gorwadkar, S.M, Matsukawa, T, Itoh, J

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SiO2/c-Si bilayer electron-beam resist process for nano-fabrication von GORWADKAR, S. M, WADA, T, HARAICHI, S, HIROSHIMA, H, ISHI, K, KOMURO, M

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Calcium substitution at yttrium site in YBa2Cu3O y von Chandrachood, M. R., Mulla, I. S., Gorwadkar, S. M., Sinha, A. P. B.

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Fabrication of Nanometer-Scale Vertical Metal-Insulator-Metal Tunnel Junctions Using a Silicon-on-Insulator Substrate von Haraichi, Satoshi, Wada, Toshimi, Gorwadkar, Sucheta M., Ishii, Kenichi

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Calcium Substitution at Yttrium Site in YBa sub 2 Cu sub 3 O sub y von Chandrachood, M R, Mulla, I S, Gorwadkar, S M, Sinha, A P B

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Calcium substitution at yttrium site in YBa2Cu3Oy von CHANDRACHOOD, M. R, MULLA, I. S, GOEWADKAR, S. M, SINHA, A. P. B

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Observation of Quantized Voltage Steps Using a Josephson Junction Array Driven by Optoelectronically Generated Pulses von Urano, C., Kaneko, N., Maezawa, M., Itatani, T., Gorwadkar, S., Saitou, H., Maeda, J., Kiryu, S.

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Improvement of yield ratio of ohmic contact to GaAs/AlGaAs heterostructure by application of SiO2 protective layer von Oe, Takehiko, Matsuhiro, Kenjiro, Itatani, Taro, Gorwadkar, Sucheta, Kiryu, Syogo, Kaneko, Nobu-hisa

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Operation of Josephson Junctions With Current Pulses Generated by Triggering a Cold Photo Detector With an Optical Comb von Urano, C.., Kaneko, N.., Maezawa, M.., Gorwadkar, S.., Itatani, T.., Saitou, H.., Maeda, J.., Kiryu, S..

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Generation of constant voltage steps by a Josephson array driven by optoelectronically generated pulses von Urano, C., Kaneko, N., Oe, T., Maezawa, M., Itatani, T., Gorwadkar, S., Saitou, H., Maeda, J., Kiryu, S.

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Ultrafast Active Transmission Lines with Low- k Polyimide Integrated with Ultrafast Photoconductive Switches von Yagi, Shuichi, Itatani, Taro, Kawanami, Hitoshi, Gorwadkar, Sucheta, Uemura, Takayuki, Fukushima, Takafumi, Itatani, Hiroshi, Tomoi, Masao, Tacano, Munecazu

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SiO 2 /c-Si Bilayer Electron-Beam Resist Process for Nano-Fabrication von Gorwadkar, Sucheta M., Wada, Toshimi, Haraichi, Satoshi, Hiroshima, Hiroshi, Kenichi Ishii, Kenichi Ishii, Masanori Komuro, Masanori Komuro

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Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy von Kuruvilla, Beena Annie, Zambre, Madhukar, Gosavi, Suresh, Gorwadkar, Sucheta, Datta, A., Gangal, S. A., Kulkarni, S. K.

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