Recent advances in non-chemically amplified photoresists for next generation IC technology von Ghosh, Subrata, Pradeep, Chullikkattil P, Sharma, Satinder K, Reddy, Pulikanti Guruprasad, Pal, Satyendra P, Gonsalves, Kenneth E

Volltext

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications von Reddy, Pulikanti Guruprasad, Pal, Satyendra Prakash, Kumar, Pawan, Pradeep, Chullikkattil P, Ghosh, Subrata, Sharma, Satinder K, Gonsalves, Kenneth E

Volltext

Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist von Reddy, Pulikanti Guruprasad, Mamidi, Narsimha, Kumar, Pawan, Sharma, Satinder K, Ghosh, Subrata, Gonsalves, Kenneth E, Pradeep, Chullikkattil P

Volltext

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning von Yogesh, Midathala, Moinuddin, Mohamad. G, Chauhan, Manvendra, Sharma, Satinder K, Ghosh, Subrata, Gonsalves, Kenneth E

Volltext

Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate von Kumar, Pawan, Reddy, Pulikanti Guruprasad, Sharma, Satinder K., Ghosh, Subrata, Pradeep, Chullikkattil P., Gonsalves, Kenneth E.

Volltext

Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications von Reddy, Pulikanti Guruprasad, Moinuddin, M. G., Joseph, Aneesh M., Nandi, Santu, Ghosh, Subrata, Pradeep, Chullikkattil P., Sharma, Satinder K., Gonsalves, Kenneth E.

Volltext

Engineering Multifunctionality in Hybrid Polyoxometalates: Aromatic Sulfonium Octamolybdates as Excellent Photochromic Materials and Self-Separating Catalysts for Epoxidation von Kumar, Ashwani, Gupta, Abhishek Kumar, Devi, Manisha, Gonsalves, Kenneth E, Pradeep, Chullikkattil P

Volltext

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography von Kumar, Rudra, Chauhan, Manvendra, Moinuddin, Mohamad G, Sharma, Satinder K, Gonsalves, Kenneth E

Volltext

New Anionic Photoacid Generator Bound Polymer Resists for EUV Lithography von Wang, Mingxing, Yueh, Wang, Gonsalves, Kenneth E

Volltext

A hybrid polymeric material bearing a ferrocene-based pendant organometallic functionality: synthesis and applications in nanopatterning using EUV lithography von Satyanarayana, V. S. V, Singh, Vikram, Kalyani, Vishwanath, Pradeep, Chullikkattil P, Sharma, Satinder, Ghosh, Subrata, Gonsalves, Kenneth E

Volltext

Co and terpolymer reactivity ratios of chemically amplified resists von Pujari, Narahari S., Wang, Mingxing, Gonsalves, Kenneth E.

Volltext

Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness von Reddy, Pulikanti Guruprasad, Thakur, Neha, Lee, Chien-Lin, Chien, Sheng-Wei, Pradeep, Chullikkattil P., Ghosh, Subrata, Tsai, Kuen-Yu, Gonsalves, Kenneth E.

Volltext

Organotin bearing polymeric resists for electron beam lithography von Yogesh, Midathala, Moinuddin, Mohamad G., Khillare, Lalit D., Chinthalapalli, Srinivas, Sharma, Satinder K., Ghosh, Subrata, Gonsalves, Kenneth E.

Volltext

Aromatic Sulfonium Polyoxomolybdates: Solid-State Photochromic Materials with Tunable Properties von Kumar, Ashwani, Devi, Manisha, Mamidi, Narsimha, Gonsalves, Kenneth E., Pradeep, Chullikkattil P.

Volltext

Influence of the Chitosan Surface Profile on the Nucleation and Growth of Calcium Carbonate Films von Zhang, Sukun, Gonsalves, Kenneth E

Volltext

EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study von Belmonte, Guilherme Kretzmann, da Silva Moura, Cleverson Alves, Reddy, Pulikanti Guruprasad, Gonsalves, Kenneth E., Weibel, Daniel Eduardo

Volltext

Organic-inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies von Guruprasad Reddy, Pulikanti, Kumar, Pawan, Ghosh, Subrata, Pradeep, Chullikkattil P, Sharma, Satinder K, Gonsalves, Kenneth E

Volltext

Lithography application of a novel photoresist for patterning of cells von He, Wei, Halberstadt, Craig R, Gonsalves, Kenneth E

Volltext

New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-Patterning von Kalyani, Vishwanath, Satyanarayana, V. S. V., Singh, Vikram, Pradeep, Chullikkattil P., Ghosh, Subrata, Sharma, Satinder K., Gonsalves, Kenneth E.

Volltext

Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography von Peter, Jerome, Moinuddin, Mohamad G, Ghosh, Subrata, Sharma, Satinder K, Gonsalves, Kenneth E

Volltext