Growth and characterization of ultrathin zirconia dielectrics grown by ultraviolet ozone oxidation von Ramanathan, Shriram, Wilk, Glen D., Muller, David A., Park, Chang-Man, McIntyre, Paul C.

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Effect of oxygen stoichiometry on the electrical properties of zirconia gate dielectrics von Ramanathan, Shriram, Muller, David A., Wilk, Glen D., Park, Chang Man, McIntyre, Paul C.

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Hf O 2 and Al 2 O 3 gate dielectrics on GaAs grown by atomic layer deposition von Frank, Martin M., Wilk, Glen D., Starodub, Dmitri, Gustafsson, Torgny, Garfunkel, Eric, Chabal, Yves J., Grazul, John, Muller, David A.

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Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides von Frank, Martin M., Chabal, Yves J., Wilk, Glen D.

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Atomic scale measurements of the interfacial electronic structure and chemistry of zirconium silicate gate dielectrics von Muller, David A., Wilk, Glen D.

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Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon von Frank, Martin M., Chabal, Yves J., Green, Martin L., Delabie, Annelies, Brijs, Bert, Wilk, Glen D., Ho, Mun-Yee, da Rosa, Elisa B. O., Baumvol, Israel J. R., Stedile, Fernanda C.

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(Invited) Current Status of High-k and Metal Gates in CMOS von Wilk, Glen D., Verghese, Mohith, Chen, Peijun, Maes, Jan Willem

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Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV von Gilmer, David C., Colombo, Daniel G., Taylor, Charles J., Roberts, Jeff, Haugstad, Greg, Campbell, Stephen A., Kim, Hyeon-Seag, Wilk, Glen D., Gribelyuk, Michael A., Gladfelter, Wayne L.

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Hf O 2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition von Frank, Martin M., Wilk, Glen D., Starodub, Dmitri, Gustafsson, Torgny, Garfunkel, Eric, Chabal, Yves J., Grazul, John, Muller, David A.

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Low temperature CVD of crystalline titanium dioxide films using tetranitratotitanium(IV) von GILMER, D. C, COLOMBO, D. G, TAYLOR, C. J, ROBERTS, J, HAUGSTAD, G, CAMPBELL, S. A, KIM, H.-S, WILK, G. D, GRIBELYUK, M. A, GLADFELTER, W. L

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Chemical vapor deposition of silicate high dielectric constant materials von Wilk, Glen D

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Chemical vapor deposition of silicate high dielectric constant materials von WILK GLEN D

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Method to form silicates as high dielectric constant materials von Wilk, Glen D

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Method to form silicates as high dielectric constant materials von WILK GLEN D

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Chemical vapor deposition of silicate high dielectric constant materials von WILK GLEN D

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Chemical vapor deposition of silicate high dielectric constant materials von Wilk, Glen D

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Chemical vapor deposition of silicate high dielectric constant materials von WILK GLEN D

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Method to form silicates as high dielectric constant materials von WILK GLEN D

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Method to form silicates as high dielectric constant materials von WILK GLEN D

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Chemical vapor deposition of silicate high dielectric constant materials von WILK, GLEN D

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