Highly reactive gas production at low pressure and temperature for diverse surface treatments or chemical reactions von GERSTENBERG, KLAUS-WOLFGANG., 25689 HALSTENBEK, DE, WANDKE, ERNST.., 82538 GERETSRIED, DE

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APPARATUS FOR COATING A SUBSTRATE BY PLASMA-CHEMICAL VAPOUR DEPOSITION OR CATHODIC SPUTTERING, AND PROCESS USING THE APPARATUS von GERSTENBERG, KLAUS WOLFGANG, DREWS, KLAUS, KUERSTEN, GERHARD, BRINGMANN, UDO, DOESSEL, OLAF HELMUT, ORLOWSKI, REINER UWE, SCHOEN, DETLEF GERD

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PROCESS FOR THE MANUFACTURE OF A THIN FILM STRAIN GAGE SYSTEM von GERSTENBERG, KLAUS WOLFGANG, DREWS, KLAUS, KUERSTEN, GERHARD, BRINGMANN, UDO, DOESSEL, OLAF HELMUT, ORLOWSKI, REINER UWE, SCHOEN, DETLEF GERD

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APPARATUS FOR COATING A SUBSTRATE BY PLASMA-CHEMICAL VAPOUR DEPOSITION OR CATHODIC SPUTTERING, AND PROCESS USING THE APPARATUS von GERSTENBERG, KLAUS WOLFGANG, KURSTEN, GERHARD, SCHON, DETLEF GERD, DOSSEL, OLAF HELMUT, DREWS, KLAUS, BRINGMANN, UDO, ORLOWSKI, REINER UWE

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Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus von GERSTENBERG, KLAUS WOLFGANG, KURSTEN, GERHARD, SCHON, DETLEF GERD, DOSSEL, OLAF HELMUT, DREWS, KLAUS, BRINGMANN, UDO, ORLOWSKI, REINER UWE

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APPARATUS FOR THE COATING OF A SUBSTRATE BY PLASMA CVD OR CATHODIC SPUTTERING, PROCESS USING THIS APPARATUS AND APPLICATION OF THIS PROCESS TO THE MANUFACTURE OF A THIN FILM STRAIN... von GERSTENBERG, KLAUS WOLFGANG, KURSTEN, GERHARD, SCHON, DETLEF GERD, DOSSEL, OLAF HELMUT, DREWS, KLAUS, BRINGMANN, UDO, ORLOWSKI, REINER UWE

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Process for the manufacture of a thin film strain gage system von GERSTENBERG, KLAUS WOLFGANG, KURSTEN, GERHARD, SCHON, DETLEF GERD, DOSSEL, OLAF HELMUT, DREWS, KLAUS, BRINGMANN, UDO, ORLOWSKI, REINER UWE

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