XPS studies of 80 K-phase Bi-Sr-Ca-Cu-O single crystals von KISHIDA, S, TOKUTAKA, H, TODA, F, FUJIMOTO, H, FUTO, W, NISHIMORI, K, ISHIHARA, N

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XPS studies of Bi-Sr-Ca-Cu-O single crystal and ceramics surfaces von KISHIDA, S, TOKUTAKA, H, NAKANISHI, S, WATANABE, Y, FUJIMOTO, H, NISHIMORI, K, ISHIHARA, N, FUTO, W, TORIGOE, S, HARADA, H

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X-Ray Photoelectron Spectroscopy Studies of 7 K-Phase Bi-System Single Crystals von Kishida, Satoru, Tokutaka, Heizo, Futo, Wataru, Fujimoto, Hiroshi, Katsumi Nishimori, Katsumi Nishimori, Naganori Ishihara, Naganori Ishihara

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME von YOSHIHARA IKUO, FUTO WATARU

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME von YOSHIHARA IKUO, FUTO WATARU

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME von YOSHIHARA IKUO, FUTO WATARU

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SEMICONDUCTOR DEVICE von YOSHIHARA IKUO, FUTO WATARU

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME von YOSHIHARA IKUO, FUTO WATARU

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The Formation of Electrodes on High-Tc Oxide Superconductors by Electroplating Method von IMAO, Hiroya, MAKIHARA, Noboru, FUTO, Wataru, KISHIDA, Satoru, TOKUTAKA, Heizo

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XPS study of 80K-phase Bi-Sr-Ca-Cu-O single crystal and thin film von FUTO, Wataru, HIGASHI, Hideaki, CHIHAYA, Makoto, KISHIDA, Satoru, TOKUTAKA, Heizo, NISHIMORI, Katsumi, ISHIHARA, Naganori

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Surface analysis of 80K-phase Bi-Sr-Ca-Cu-O single crystal and thin film by SEM and SAM von KOYAMA, Syoichi, FUTO, Wataru, HIGASHI, Hideaki, FUJIMOTO, Hiroshi, ISHIHARA, Naganori, KISHIDA, Satoru, TOKUTAKA, Heizo, NISHIMORI, Katsumi

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Semiconductor device manufacturing method von TAKAGI HIDEO, FUTO WATARU

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XPS Measurements of 7K-Phase Bi-Sr-Ca-Cu-O Superconducting Single Crystals von TODA, Fumihiko, KISHIDA, Satoru, TOKUTAKA, Heizo, FUTO, Wataru, FUJIMOTO, Hiroshi, NISHIMORI, Katsumi, ISHIHARA, Naganori

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Semiconductor device and method for fabricating the same von IIO, HIROKI, FUTO, WATARU, HASHIMOTO, KOICHI

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Method of manufacturing a semiconductor device with self-aligned contacts von INOUE KENICHI, TSUBOI OSAMU, HASHIMOTO KOICHI, ITABASHI KAZUO, FUTO WATARU, YOKOYAMA YUJI

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Method of manufacturing a semiconductor device with self-aligned contacts von Itabashi, Kazuo, Tsuboi, Osamu, Yokoyama, Yuji, Inoue, Kenichi, Hashimoto, Koichi, Futo, Wataru

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Semiconductor device with self-aligned contact and its manufacture von Itabashi, Kazuo, Tsuboi, Osamu, Yokoyama, Yuji, Inoue, Kenichi, Hashimoto, Koichi, Futo, Wataru

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Semiconductor device with self-aligned contact and its manufacture von INOUE KENICHI, TSUBOI OSAMU, HASHIMOTO KOICHI, ITABASHI KAZUO, FUTO WATARU, YOKOYAMA YUJI

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Semiconductor device with self-aligned contact and its manufacture von INOUE KENICHI, TSUBOI OSAMU, HASHIMOTO KOICHI, ITABASHI KAZUO, FUTO WATARU, YOKOYAMA YUJI

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Semiconductor device with self-aligned contact and its manufacture von Itabashi, Kazuo, Tsuboi, Osamu, Yokoyama, Yuji, Inoue, Kenichi, Hashimoto, Koichi, Futo, Wataru

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