(Invited) Ge-on-Insulator MOSFETs for High-Performance and 3D-LSI Applications von Tezuka, Tsutomu, Ikeda, Keiji, Kamata, Yoshiki, Kamimuta, Yuuichi, Usuda, Koji, Moriyama, Yoshihiko, Ono, Mizuki, Koike, Masahiro, Oda, Minoru, Irisawa, Toshifumi, Mieda, Eiko, Maeda, Tatsuro, Jevasuwan, Wipakorn, Kurashima, Yuichi, Takagi, Hideki, Furuse, Kiyoe, Kurosawa, Etsuo

Volltext

Enhancement of hole mobility and cut-off characteristics of strained Ge nanowire pMOSFETs by using plasma oxidized GeOx inter-layer for gate stack von Ikeda, Keiji, Kamimuta, Yuuichi, Moriyama, Yoshihiko, Ono, Mizuki, Usuda, Koji, Oda, Minoru, Irisawa, Toshifumi, Furuse, Kiyoe, Tezuka, Tsutomu

Volltext

Superior cut-off characteristics of Lg=40nm Wfin=7nm poly Ge junctionless Tri-gate FET for stacked 3D circuits integration von Kamata, Yoshiki, Kamimuta, Yuuichi, Ikeda, Keiji, Furuse, Kiyoe, Ono, Mizuki, Oda, Minoru, Moriyama, Yoshihiko, Usuda, Koji, Koike, Masahiro, Irisawa, Toshifumi, Kurosawa, Etsuo, Tezuka, Tsutomu

Volltext

Semiconductor device using Ge channel and manufacturing method thereof von Kamimuta Yuuichi, Tezuka Tsutomu, Ikeda Keiji, Furuse Kiyoe

Volltext bestellen

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF von TEZUKA TSUTOMU, FURUSE KIYOE, KAMIMUTA YUUICHI, IKEDA KEIJI

Volltext bestellen

LAYERED SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME von TEZUKA TSUTOMU, FURUSE KIYOE, KAMIMUTA YUICHI, IKEDA KEIJI

Volltext bestellen

Short channel poly-Ge junction-less p-type FinFETs for BEOL transistors von Kamimuta, Y., Ikeda, K., Furuse, K., Irisawa, T., Tezuka, T.

Volltext bestellen

Invited; Ge-on-Insulator MOSFETs for High-Performance and 3D-LSI Applications von Tezuka, Tsutomu, Ikeda, Keiji, Kamata, Yoshiki, Kamimuta, Yuuichi, Usuda, Koji, Moriyama, Yoshihiko, Ono, Mizuki, Koike, Masahiro, Oda, Minoru, Irisawa, Toshifumi, Mieda, Eiko, Maeda, Tatsuro, Jevasuwan, Wipakorn, Kurashima, Yuichi, Takagi, Hideki, Furuse, Kiyoe, Kurosawa, Etsuo

Volltext

TWI525795B von IKEDA, KEIJI, TEZUKA, TSUTOMU, FURUSE, KIYOE, KAMIMUTA, YUUICHI

Volltext bestellen

Stacked semiconductor device and method for manufacturing same von IKEDA, KEIJI, TEZUKA, TSUTOMU, FURUSE, KIYOE, KAMIMUTA, YUUICHI

Volltext bestellen

STACKED SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME von IKEDA, KEIJI, TEZUKA, TSUTOMU, FURUSE, KIYOE, KAMIMUTA, YUUICHI

Volltext bestellen