Laser processing of amorphous silicon for large-area polysilicon imagers von Boyce, J.B., Fulks, R.T., Ho, J., Lau, R., Lu, J.P., Mei, P., Street, R.A., Van Schuylenbergh, K.F., Wang, Y.

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Excimer laser processing for a-Si and poly-Si thin film transistors for imager applications von Lu, J. P., Mei, P., Fulks, R. T., Rahn, J., Ho, J., Wang, Y., Boyce, J. B., Street, R. A.

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A new laser-processed polysilicon TFT architecture von Fulks, R.T., Ho, J., Boyce, J.B.

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Optimization of BF2+ implanted and rapidly annealed junctions in silicon von WU, I-W, FULKS, R. T, MIKKELSEN, J. C. JR

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Rapid isothermal annealing of ion implantation damage using a thermal radiation source von Fulks, R. T., Russo, C. J., Hanley, P. R., Kamins, T. I.

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Control of titanium-silicon and silicon dioxide reactions by low-temperature rapid thermal annealing von BRILLSON, L. J, SLADE, M. L, RICHTER, H. W, VANDER PLAS, H, FULKS, R. T

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Scanned electron beam annealing of boron-implanted diodes von Yep, T. O., Fulks, R. T., Powell, R. A.

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Pulsed laser crystallization and doping for thin film transistors von Mei, P, Boyce, J.B, Lu, J.P, Ho, J, Fulks, R.T

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Reactions of thin-film titanium on silicon studied by Raman spectroscopy von Nemanich, R. J., Fulks, R. T., Stafford, B. L., Vander Plas, H. A.

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Activation of arsenic-implanted silicon using an incoherent light source von Powell, R. A., Yep, T. O., Fulks, R. T.

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Formation of titanium silicide films by rapid thermal processing von Powell, R.A., Chow, R., Thridandam, C., Fulks, R.T., Blech, I.A., Pan, J.-D.T.

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Low temperature amorphous silicon channel material for polysilicon thin film transistors von Fulks, R.T, Ho, J, Boyce, J.B, Davis, G.A, Aebi, V

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Laser Processing of Polysilicon Thin-Film Transistors: Grain Growth and Device Fabrication von Boyce, J. B., Mei, P., Fulks, R. T., Ho, J.

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Oxide charges induced in thermal silicon dioxide by scanning electron and laser beam annealing von Razouk, R. R., Delfino, M., Fulks, R. T., Powell, R. A., Yep, T. O.

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A Comparative Grammar of the Early Germanic Languages von Fulk, Robert D

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Oxide charges induced in thermal silicon dioxide by scanning electron and thermal laser beam annealing von Razouk, R R, Delfino, M, Fulks, R T

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MoSi(2)formation by rapid isothermal annealing von Fulks, R T, Powell, R A, Stacy, W T

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"Diabatic" for "Non-adiabatic" von Fulks, T. R.

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Rapid Isothermal Annealing for Semiconductor Applications: Aspects of Equipment Design von Russo, C. J., Downey, D. F., Holden, S. C., Fulks, R. T.

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Valomaciclovir versus valacyclovir for the treatment of acute herpes zoster in immunocompetent adults: A randomized, double-blind, active-controlled trial von Tyring, Stephen K., Plunkett, Stephanie, Scribner, Anita R., Broker, Robert E., Herrod, John N., Handke, Lane T., Wise, John M., Martin, Paul A.

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