Diffusion of copper through dielectric films under bias temperature stress von Raghavan, Gopal, Chiang, Chien, Anders, Paul B., Tzeng, Sing-Mo, Villasol, Reynaldo, Bai, Gang, Bohr, Mark, Fraser, David B.

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Growth of epitaxial CoSi2 on (100)Si von Dass, M. Lawrence A., Fraser, David B., Wei, Chih-Shih

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The Relative Buffering Capacities of Saliva and Moist Snuff: Implications for Nicotine Absorption von Ciolino, Laura A., McCauley, Heather A., Fraser, Diane B., Wolnik, Karen A.

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Constructing a curriculum vitae: the radiologist's resume von Logan, P M, Fraser, D B

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Reversed Phase Ion-Pair Liquid Chromatographic Determination of Nicotine in Commercial Tobacco Products. 2. Cigarettes von Ciolino, Laura A, Fraser, Diane B, Yi, Timothy Y, Turner, James A, Barnett, Debra Y, McCauley, Heather A

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Reversed Phase Ion-Pair Liquid Chromatographic Determination of Nicotine in Commercial Tobacco Products. 1. Moist Snuff von Ciolino, Laura A, McCauley, Heather A, Fraser, Diane B, Barnett, Debra Y, Yi, Timothy Y, Turner, James A

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Finite-element modeling and X-ray measurement of strain in passivated Al lines during thermal cycling von Besser, P.R., Bravman, J.C., Mack, A.S., Fraser, D.B.

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Formation of epitaxial CoSi2 on Si(100) : role of the annealing ambient von VANTOMME, A, NICOLET, M.-A, GANG BAI, FRASER, D. B

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Thin film interaction between titanium and polycrystalline silicon von Murarka, S. P., Fraser, D. B.

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In   situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si(100) von Selinder, T. I., Roberts, T. A., Miller, D. J., Beno, M. A., Knapp, G. S., Gray, K. E., Ogawa, S., Fair, J. A., Fraser, D. B.

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Growth of epitaxial CoSi2 on Si(100) using Si(100)/Ti/Co bilayers von VANTOMME, A, NICOLET, M.-A, GANG BAI, FRASER, D. B

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Gate bias polarity dependence of charge trapping and time-dependent dielectric breakdown in nitrided and reoxidized nitrided oxides von Wu, A.T., Murali, V., Nulman, J., Triplett, B., Fraser, D.B., Garner, M.

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Self-aligned cobalt disilicide for gate and interconnection and contacts to shallow junctions von Murarka, S.P., Fraser, D.B., Sinha, A.K., Levinstein, H.J., Lloyd, E.J., Liu, R., Williams, D.S., Hillenius, S.J.

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Refractory silicides of titanium and tantalum for low-resistivity gates and interconnects von Murarka, S.P., Fraser, D.B., Sinha, A.K., Levinstein, H.J.

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Resistivities of Thin Film Transition Metal Silicides von Murarka, S. P., Read, M. H., Doherty, C. J., Fraser, D. B.

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The complications of coronary arteriography von Adams, D F, Fraser, D B, Abrams, H L

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Silicide formation in thin cosputtered (tantalum + silicon) films on polycrystalline silicon and SiO2 von Murarka, S. P., Fraser, D. B.

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Effect of a contact and protective seal on aluminum electromigration von Teal, V., Vaidya, S., Fraser, D.B.

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A novel technique for in-line monitoring of micro-contamination and process induced damage von Murali, V., Wu, A.T., Chatterjee, A.K., Fraser, D.B.

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Factors Influencing the Acoustic Properties of Vitreous Silica von Fraser, David B.

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