Praseodymium Silicate as a High-k Dielectric Candidate: An Insight into the Pr2O3-Film/Si-Substrate Interface Fabricated Through a Metal-Organic Chemical Vapor Deposition Process von Lo Nigro, R., Toro, R. G., Malandrino, G., Condorelli, G. G., Raineri, V., Fragalà, I. L.

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Effects of processing parameters in the mocvd growth of nanostructured lanthanum tritluoride and oxyfluoride thin films von Malandrino, Graziella, Perdicaro, Laura M S, Fragald, Ignazio L

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An MOCVD Approach to High-k Praseodymium-Based Films von Lo Nigro, R., Malandrino, G., Toro, R. G., Fragalà, I. L.

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MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation von Bedoya, C., Condorelli, G. G., Finocchiaro, S. T., Di Mauro, A., Atanasio, D., Fragalà, I. L., Cattaneo, L., Carella, S.

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MOCVD of Sr-Containing Oxides: Transport Properties and Deposition Mechanisms of the Sr(tmhd)2pmdeta Precursor von Bedoya, Cedric, Condorelli, Guglielmo G, Motta, Alessandro, Mauro, Alessandro Di, Anastasi, Giuseppe, Fragald, Ignazio L, Lisoni, Judit G, Wouters, Dirk

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Comparison of Thermal and Mass-Transport Properties of Bi(tmhd)3, Bi(p-tol)3, and Bi(o-tol)3 MOCVD Precursors von Bedoya, C., Condorelli, G. G., Finocchiaro, S. T., Di Mauro, A., Fragalà, I. L., Cattaneo, L., Carella, S.

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