Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide von Kukli, Kaupo, Forsgren, Katarina, Aarik, Jaan, Uustare, Teet, Aidla, Aleks, Niskanen, Antti, Ritala, Mikko, Leskelä, Markku, Hårsta, Anders

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Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor von KUKLI, Kaupo, FORSGREN, Katarina, RITALA, Mikko, LESKELÄ, Markku, AARIK, Jaan, HARSTA, Anders

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Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon von Kukli, Kaupo, Ritala, Mikko, Uustare, Teet, Aarik, Jaan, Forsgren, Katarina, Sajavaara, Timo, Leskelä, Markku, Hårsta, Anders

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Deposition of HfO2 thin films in HfI4-based processes von FORSGREN, Katarina, HARSTA, Anders, AARIK, Jaan, AIDLA, Aleks, WESTLINDER, Jörgen, OLSSON, Jörgen

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Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor von Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Forsgren, Katarina, Sundqvist, Jonas, Hårsta, Anders, Uustare, Teet, Mändar, Hugo, Kiisler, Alma-Asta

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Halide chemical vapour deposition of Ta 2O 5 von Forsgren, Katarina, H«rsta, Anders

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Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology von Forsgren Katarina , Uppsala universitet, Institutionen för materialkemi, Forsgren Katarina, Uppsala University, Department of Materials Chemistry

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Halide chemical vapour deposition of Ta2O5 von Forsgren, Katarina, H«rsta, Anders

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Deposition of HfO[sub 2] Thin Films in HfI[sub 4]-Based Processes von Forsgren, Katarina, Hårsta, Anders, Aarik, Jaan, Aidla, Aleks, Westlinder, Jörgen, Olsson, Jörgen

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CVD and ALD of Group IV- and V-Oxides for Dielectric Applications von Forsgren, Katarina

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Iodide-Based Atomic Layer Deposition of ZrO2: Aspects of Phase Stability and Dielectric Properties von Forsgren, K., Westlinder, J., Lu, J., Olsson, J., Hårsta, A.

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CVD and ALD of Group IV- and V-Oxides for Dielectric Applications von Forsgren, Katarina

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ChemInform Abstract: Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor von Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Forsgren, Katarina, Sundqvist, Jonas, Haarsta, Anders, Uustare, Teet, Maendar, Hugo, Kiisler, Alma-Asta

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Sedimentation rate and suPAR in relation to disease activity and mortality in patients with tuberculosis von Schulman, H., Niward, K., Abate, E., Idh, J., Axenram, P., Bornefall, A., Forsgren, S., Jakobsson, J., öhrling, C., Kron, M., Brudin, L., Diro, E., Getachew Kebede, A., Paues, J., Bruchfeld, J., Wejse, C., Stendahl, O., Schön, T.

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MAGDALENA: study protocol of a randomised, placebo-controlled trial on cognitive development at 2 years of age in children exposed to SSRI in utero von Heinonen, Essi, Szymanska-von Schultz, Barbara, Kaldo, Viktor, Nasiell, Josefine, Andersson, Ewa, Bergmark, Mikaela, Blomdahl-Wetterholm, Margareta, Forsberg, Lisa, Forsell, Erik, Forsgren, Anna, Frööjd, Sandra, Goldman, Amy, Nordenadler, Eva-Mari, Sklivanioti, Myrto, Blennow, Mats, Wide, Katarina, Gustafsson, Lars L

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Att leva med Parkinsons sjukdom: med fokus på konsekvenser i dagligt liv för kvinnor och män von Sperens, Maria

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