Characterization of Er3+-doped glasses by fluorescence line narrowing von ZEMON, S, LAMBERT, G, ANDREWS, L. J, MINISCALCO, W. J, HALL, B. T, WEI, T, FOLWEILER, R. C

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Excited-state-absorption cross sections and amplifier modeling in the 1300-nm region for Nd-doped glasses von Zemon, S., Pedersen, B., Lambert, G., Miniscalco, W.J., Hall, B.T., Folweiler, R.C., Thompson, B.A., Andrews, L.J.

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Pyrolytic Synthesis of Titanium Diboride von GANNON, R. E., FOLWEILER, R. C., VASILOS, T.

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Top-seeded solution growth of oxide crystals from non-stoichiometric melts von Belruss, V., Kalnajs, J., Linz, A., Folweiler, R.C.

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Stimulated emission in multiply doped Ho 3+ :YLF and YAG - A comparison von Chicklis, E., Naiman, C., Folweiler, R., Doherty, J.

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Stimulated emission in multiply doped Ho3+:YLF and YAG - A comparison von Chicklis, E., Naiman, C., Folweiler, R., Doherty, J.

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High-Efficiency Room-Temperature 2.06-μm Laser Using Sensitized Ho3+:YLF von Chicklis, E. P., Naiman, C. S., Folweiler, R. C., Gabbe, D. R., Jenssen, H. P., Linz, A.

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Er: YLF Laser Development von Chicklis, E P, Folweiler, R C, Naiman, C S, Gabbe, D R, Linz, A

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Er: YLF Laser Development. Part 2 von Chicklis, E P, Folweiler, R C, Kuppenheimer, J D, Naiman, C S, Gabbe, D R

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Arc Image Furnace System for Electrical Conductivity and Thermal Expansion Measurements von Folweiler, Robert C., Schaffer, Philip S.

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The effect of quenched-in vacancies on the elastic modulus of aluminum von Folweiler, R.G, Brotzen, F.R

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Creep Behavior of Pore-Free Polycrystalline Aluminum Oxide von Folweiler, Robert C.

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Stimulated emission in multiply doped Ho(3+):YLF and YAG--A comparison von Naiman, C, Folweiler, R, Doherty, J

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Low-threshold room-temperature lasing action in Ho(3+):YLF and YAG von Naiman, C, Folweiler, R, Doherty, J

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Low-threshold room-temperature lasing action in Ho3+:YLF and YAG von Chicklis, E., Naiman, C., Folweiler, R., Doherty, J.

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Low-threshold room-temperature lasing action in Ho 3+ :YLF and YAG von Chicklis, E., Naiman, C., Folweiler, R., Doherty, J.

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Development of Multiply Sensitized Ho:YLF as a Laser Material von Chicklis, Evan P, Folweiler, Robert C, Naiman, Charles S, Gabbe, D R, Linz, Arthur

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0.85 Micron Solid State Laser Material Evaluation. Part 3 von Chicklis, Evan P, Gabbe, David R, Folweiler, Robert C, Naiman, Charles S, Jenssen, Han P

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