Modeling of CW laser diode irradiation of amorphous silicon films von Said-Bacar, Z., Leroy, Y., Antoni, F., Slaoui, A., Fogarassy, E.

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CW laser induced crystallization of thin amorphous silicon films deposited by EBE and PECVD von Said-Bacar, Z., Prathap, P., Cayron, C., Mermet, F., Leroy, Y., Antoni, F., Slaoui, A., Fogarassy, E.

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Treatment of high arsenic content wastewater by membrane filtration von Fogarassy, E., Galambos, I., Bekassy-Molnar, E., Vatai, Gy

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Long-pulse excimer laser crystallization and doping for the fabrication of high performance polysilicon TFTs von Fogarassy, É., Venturini, J.

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Dopant diffusion and activation induced by sub-melt laser anneal within the co-implanted p+ polycrystalline silicon gate used in CMOS technologies von Colin, A., Morin, P., Beneyton, R., Pinzelli, Luc, Mathiot, D., Fogarassy, E.

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Numerical and experimental analysis of pulsed excimer laser processing of silicon carbide von Dutto, C, Fogarassy, E, Mathiot, D

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Optical–thermal simulation applied to the study of the pattern effects induced by the sub-melt laser anneal process in advanced CMOS technologies von Colin, A., Morin, P., Cacho, F., Bono, H., Beneyton, R., Mathiot, D., Fogarassy, E.

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Fabrication and investigation of 1D and 2D structures in LiNbO3 thin films by pulsed laser ablation von MERICHE, F, BOUDRIOUA, A, KREMER, R, DOGHECHE, E, NEISS-CLAUSS, E, MOURAS, R, FISCHER, A, BEGHOUL, M.-R, FOGARASSY, E, BOUTAOUI, N

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Diode laser soldering using a lead-free filler material for electronic packaging structures von Chaminade, C., Fogarassy, E., Boisselier, D.

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Simulation of the sub-melt laser anneal process in 45 CMOS technology—Application to the thermal pattern effects von Colin, A., Morin, P., Cacho, F., Bono, H., Beneyton, R., Bidaud, M., Mathiot, D., Fogarassy, E.

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Micro structuring of LiNbO3 by using nanosecond pulsed laser ablation von Meriche, F., Neiss-Clauss, E., Kremer, R., Boudrioua, A., Dogheche, E., Fogarassy, E., Mouras, R., Bouabellou, A.

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Mechanisms and application of the Excimer laser doping from spin-on glass sources for USJ fabrication von Coutanson, S., Fogarassy, E., Venturini, J.

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The combined effect of laser fluence and target deterioration in determining the chemical composition of pulsed laser deposited boron carbide films von Szörényi, T., Stoquert, J.-P., Antoni, F., Fogarassy, E.

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XPS study of pulsed laser deposited CNx films von Le Normand, F., Hommet, J., Szörényi, T., Fuchs, C., Fogarassy, E.

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On the growth mechanism of pulsed laser deposited carbon nitride films von Szörényi, T., Fogarassy, E.

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Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies von Szörényi, T., Fuchs, C., Fogarassy, E., Hommet, J., Le Normand, F.

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Number density and size distribution of droplets in KrF excimer laser deposited boron carbide films von Szörényi, T., Stuck, R., Antoni, F., Fogarassy, E.

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Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy von Montgomery, P.C., Benatmane, A., Fogarassy, E., Ponpon, J.P.

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Experimental and numerical analysis of surface melt dynamics in 200 ns-excimer laser crystallization of a-Si films on glass von Fogarassy, E., de Unamuno, S., Prévot, B., Harrer, T., Maresch, S.

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Interference microscopy for nanometric surface microstructure analysis in excimer laser processing of silicon for flat panel displays von Benatmane, A., Montgomery, P.C., Fogarassy, E., Zahorski, D.

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