A new facility for the synchrotron radiation-based calibration of transfer radiation sources in the ultraviolet and vacuum ultraviolet spectral range von Thornagel, Reiner, Fliegauf, Rolf, Klein, Roman, Kroth, Simone, Paustian, Wolfgang, Richter, Mathias

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Quantitative surface characterization of silicon spheres by combined XRF and XPS analysis for the determination of the Avogadro constant von Müller, Matthias, Beckhoff, Burkhard, Beyer, Edyta, Darlatt, Erik, Fliegauf, Rolf, Ulm, Gerhard, Kolbe, Michael

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Operation of the Metrology Light Source as a primary radiation source standard von Klein, Roman, Brandt, Guido, Fliegauf, Rolf, Hoehl, Arne, Müller, Ralph, Thornagel, Reiner, Ulm, Gerhard, Abo-Bakr, Michael, Feikes, Jörg, Hartrott, Michael v., Holldack, Karsten, Wüstefeld, Godehard

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Reference-Free Total Reflection X-ray Fluorescence Analysis of Semiconductor Surfaces with Synchrotron Radiation von Beckhoff, Burkhard, Fliegauf, Rolf, Kolbe, Michael, Müller, Matthias, Weser, Jan, Ulm, Gerhard

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Quantification via X‐ray fluorescence analysis of oxygen in the surface layer of a Si‐sphere used as a new mass standard von Wu, Yu‐Hsin, Tsao, Lin, Chiu, Jeng‐Yu, Chen, Sheng‐Jui, Fliegauf, Rolf, Müller, Matthias, Beyer, Edyta, Kolbe, Michael

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Development of a combined XRF/XPS surface-analysis system for the surface-layer quantification of 28Si spheres von Wu, Yu-Hsin, Chiu, Jeng-Yu, Chen, Sheng-Jui, Kolbe, Michael, Fliegauf, Rolf, Beyer, Edyta, Haertig, Frank

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Complementary methodologies for thin film characterization in one tool - a novel instrument for 450 mm wafers von Holfelder, Ina, Beckhoff, Burkhard, Fliegauf, Rolf, Hönicke, Philipp, Nutsch, Andreas, Petrik, Peter, Roeder, Georg, Weser, Jan

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Radiometric comparison of the primary source standard 'Metrology Light Source' to a primary detector standard von Klein, Roman, Gottwald, Alexander, Brandt, Guido, Fliegauf, Rolf, Hoehl, Arne, Kroth, Udo, Kaser, Hendrik, Richter, Mathias, Thornagel, Reiner, Ulm, Gerhard

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The spectral response of superconducting tunnel junction X-ray detectors von Friedrich, Stephan, Fliegauf, Rolf, Frank, Matthias, Veldkamp, Markus, Labov, Simon, Beckhoff, Burkhard, Ulm, Gerhard

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Wafer Contamination Analysis, Speciation and Reference-free Nanolayer Characterization using Synchrotron Radiation based X-ray Spectrometry von Beckhoff, Burkhard, Fliegauf, Rolf, Kolbe, Michael, Müller, Matthias, Pollakowski, Beatrix, Weser, Jan, Ulm, Gerhard

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Advanced Metrologies for Wafer Contamination and Nanolayer Characterization Using XRF Methods von Beckhoff, Burkhard, Fliegauf, Rolf, Hönicke, Philipp, Kolbe, Michael, Müller, Matthias, Pollakowski, Beatrix, Weser, Jan, Ulm, Gerhard

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Probenpositioniereinrichtung und Verfahren zu ihrem Betrieb von Nutsch, Andreas, Holfelder, I, Fliegauf, Rolf, Weser, J, Beckhoff, B

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Advanced Metrology for Wafer Contamination and Nanolayer Characterization Using XRF Methods von Beckhoff, Burkhard, Fliegauf, Rolf, Hoenicke, Philipp, Kolbe, Michael, Mueller, Matthias, Pollakowski, Beatrix, Weser, Jan, Ulm, Gerhard

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SAMPLE POSITIONING DEVICE AND METHOD FOR OPERATION THEREOF von WESER, JAN, NUTSCH, ANDREAS, HOLFELDER, INA, FLIEGAUF, ROLF

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Probenpositioniereinrichtung und Verfahren zu ihrem Betrieb von WESER, JAN, NUTSCH, ANDREAS, HOLFELDER, INA, FLIEGAUF, ROLF, BECKHOFF, BURKHARD

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