Phase-Exchange-Driven Wake-Up and Fatigue in Ferroelectric Hafnium Zirconium Oxide Films von Fields, Shelby S, Smith, Sean W, Ryan, Philip J, Jaszewski, Samantha T, Brummel, Ian A, Salanova, Alejandro, Esteves, Giovanni, Wolfley, Steve L, Henry, Michael D, Davids, Paul S, Ihlefeld, Jon F

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Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum von Lee, Younghwan, Alex Hsain, H., Fields, Shelby S., Jaszewski, Samantha T., Horgan, Madison D., Edgington, Patrick G., Ihlefeld, Jon F., Parsons, Gregory N., Jones, Jacob L.

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Asymmetric Electrode Work Function Customization via Top Electrode Replacement in Ferroelectric and Field‐Induced Ferroelectric Hafnium Zirconium Oxide Thin Films von Fields, Shelby S., Jaszewski, Samantha T., Lenox, Megan K., Ihlefeld, Jon F.

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A Perspective on ferroelectricity in hafnium oxide: Mechanisms and considerations regarding its stability and performance von Ihlefeld, Jon F., Jaszewski, Samantha T., Fields, Shelby S.

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Publisher's Note: “A Perspective on ferroelectricity in hafnium oxide: Mechanisms and considerations regarding its stability and performance” [Appl. Phys. Lett. 121, 240502 (2022)]... von Ihlefeld, Jon F., Jaszewski, Samantha T., Fields, Shelby S.

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Ferroelectricity in hafnia controlled via surface electrochemical state von Kelley, Kyle P., Morozovska, Anna N., Eliseev, Eugene A., Liu, Yongtao, Fields, Shelby S., Jaszewski, Samantha T., Mimura, Takanori, Calderon, Sebastian, Dickey, Elizabeth C., Ihlefeld, Jon F., Kalinin, Sergei V.

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Impact of Electric Field Pulse Duration on Ferroelectric Hafnium Zirconium Oxide Thin Film Capacitor Endurance von Lenox, Megan K., Jaszewski, Samantha T., Fields, Shelby S., Shukla, Nikhil, Ihlefeld, Jon F.

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Exploring leakage in dielectric films via automated experiments in scanning probe microscopy von Liu, Yongtao, Fields, Shelby S., Mimura, Takanori, Kelley, Kyle P., Trolier-McKinstry, Susan, Ihlefeld, Jon F., Kalinin, Sergei V.

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Wake-up and fatigue mechanisms in ferroelectric Hf0.5Zr0.5O2 films with symmetric RuO2 electrodes von Fields, Shelby S., Smith, Sean W., Jaszewski, Samantha T., Mimura, Takanori, Dickie, Diane A., Esteves, Giovanni, David Henry, M., Wolfley, Steve L., Davids, Paul S., Ihlefeld, Jon F.

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Impacts to FeRAM design arising from interfacial dielectric layers and wake up modulation in ferroelectric hafnium zirconium oxide von Henry, M. David, Smith, Sean W., Fields, Shelby S., Jaszewski, Samantha T., Esteves, Giovanni, Heinrich, Helge, Ihlefeld, Jon F.

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Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films von Fields, Shelby S., Olson, David H., Jaszewski, Samantha T., Fancher, Chris M., Smith, Sean W., Dickie, Diane A., Esteves, Giovanni, Henry, M. David, Davids, Paul S., Hopkins, Patrick E., Ihlefeld, Jon F.

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Mapping Ferroelectric Fields Reveals the Origins of the Coercivity Distribution von Chan, Ho Leung, Fields, Shelby S., Chen, Yueyun, O’Neill, Tristan P., Lenox, Megan K., Hubbard, William A., Ihlefeld, Jon F., Regan, Brian C.

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Infrared Signatures for Phase Identification in Hafnium Oxide Thin Films von Jaszewski, Samantha T., Calderon, Sebastian, Shrestha, Bishal, Fields, Shelby S., Samanta, Atanu, Vega, Fernando J., Minyard, Jacob D., Casamento, Joseph A., Maria, Jon-Paul, Podraza, Nikolas J., Dickey, Elizabeth C., Rappe, Andrew M., Beechem, Thomas E., Ihlefeld, Jon F.

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Electrode Elastic Modulus as the Dominant Factor in the Capping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films von Lenox, Megan K, Islam, Md Rafiqul, Hoque, Md Shafkat Bin, Skidmore, Chloe H, Salanova, Alejandro, Fields, Shelby S, Jaszewski, Samantha T, Maria, Jon-Paul, Hopkins, Patrick E, Ihlefeld, Jon F

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Compositional dependence of linear and nonlinear optical response in crystalline hafnium zirconium oxide thin films von Ihlefeld, Jon F., Luk, Ting S., Smith, Sean W., Fields, Shelby S., Jaszewski, Samantha T., Hirt, Daniel M., Riffe, Will T., Bender, Scott, Constantin, Costel, Ayyasamy, Mukil V., Balachandran, Prasanna V., Lu, Ping, David Henry, M., Davids, Paul S.

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Thermal resistance and heat capacity in hafnium zirconium oxide (Hf1–xZrxO2) dielectrics and ferroelectric thin films von Scott, Ethan A., Smith, Sean W., Henry, M. David, Rost, Christina M., Giri, Ashutosh, Gaskins, John T., Fields, Shelby S., Jaszewski, Samantha T., Ihlefeld, Jon F., Hopkins, Patrick E.

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Erratum: “Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films” [Appl. Phys. Lett. 118, 102901 (2021)] von Fields, Shelby S., Olson, David H., Jaszewski, Samantha T., Fancher, Chris M., Smith, Sean W., Dickie, Diane A., Esteves, Giovanni, Henry, M. David, Davids, Paul S., Hopkins, Patrick E., Ihlefeld, Jon F.

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Machine Learning-Driven Automated Scanning Probe Microscopy for Ferroelectrics von Liu, Yongtao, Kelley, Kyle P., Vasudevan, Rama K., Funakubo, Hiroshi, Fields, Shelby S., Mimura, Takanori, Trolier-McKinstry, Susan, Ihlefeld, Jon F., Ziatdinov, Maxim, Kalinin, Sergei V.

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Determining the Polarization Fraction of Thin Film Ferroelectric HZO with STEM EBIC von Chan, Ho Leung, Fields, Shelby S., O'Neill, Tristan, Chen, Yueyun, Hubbard, William A., Ihlefeld, Jon F., Regan, B. C.

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Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf0.5Zr0.5O2 Thin Films von Fields, Shelby S., Smith, Sean W., Fancher, Chris M., Henry, Michael David, Wolfley, Steve L., Sales, Maria G., Jaszewski, Samantha T., Rodriguez, Mark A., Esteves, Giovanni, Davids, Paul S., McDonnell, Stephen J., Ihlefeld, Jon F.

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