Optimizing process conditions for improved Hf1−xZrxO2 ferroelectric capacitor performance von Mittmann, Terence, Fengler, Franz P.G., Richter, Claudia, Park, Min Hyuk, Mikolajick, Thomas, Schroeder, Uwe

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Unveiling the double-well energy landscape in a ferroelectric layer von Hoffmann, Michael, Fengler, Franz P. G., Herzig, Melanie, Mittmann, Terence, Max, Benjamin, Schroeder, Uwe, Negrea, Raluca, Lucian, Pintilie, Slesazeck, Stefan, Mikolajick, Thomas

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Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material von Schroeder, Uwe, Richter, Claudia, Park, Min Hyuk, Schenk, Tony, Pešić, Milan, Hoffmann, Michael, Fengler, Franz P. G, Pohl, Darius, Rellinghaus, Bernd, Zhou, Chuanzhen, Chung, Ching-Chang, Jones, Jacob L, Mikolajick, Thomas

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Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment von Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Schenk, Tony, Lee, Woongkyu, Kim, Keum Do, Fengler, Franz P G, Mikolajick, Thomas, Schroeder, Uwe, Hwang, Cheol Seong

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Domain Pinning: Comparison of Hafnia and PZT Based Ferroelectrics von Fengler, Franz P. G., Pešić, Milan, Starschich, Sergej, Schneller, Theodor, Künneth, Christopher, Böttger, Ulrich, Mulaosmanovic, Halid, Schenk, Tony, Park, Min Hyuk, Nigon, Robin, Muralt, Paul, Mikolajick, Thomas, Schroeder, Uwe

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Analysis of Performance Instabilities of Hafnia‐Based Ferroelectrics Using Modulus Spectroscopy and Thermally Stimulated Depolarization Currents von Fengler, Franz P. G., Nigon, Robin, Muralt, Paul, Grimley, Everett D., Sang, Xiahan, Sessi, Violetta, Hentschel, Rico, LeBeau, James M., Mikolajick, Thomas, Schroeder, Uwe

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A Silicon Nanowire Ferroelectric Field‐Effect Transistor von Sessi, Violetta, Simon, Maik, Mulaosmanovic, Halid, Pohl, Darius, Loeffler, Markus, Mauersberger, Tom, Fengler, Franz P. G., Mittmann, Terence, Richter, Claudia, Slesazeck, Stefan, Mikolajick, Thomas, Weber, Walter M.

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Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering von Simon, Daniel K., Tröger, David, Schenk, Tony, Dirnstorfer, Ingo, Fengler, Franz P. G., Jordan, Paul M., Krause, Andreas, Mikolajick, Thomas

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2D Mapping of Chemical and Field Effect Passivation of Al2O3 on Silicon Substrates von Jordan, Paul M., Simon, Daniel K., Fengler, Franz P.G., Mikolajick, Thomas, Dirnstorfer, Ingo

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Low-thermal budget flash light annealing for Al2O3 surface passivation von Simon, Daniel K., Henke, Thomas, Jordan, Paul M., Fengler, Franz P. G., Mikolajick, Thomas, Bartha, Johann W., Dirnstorfer, Ingo

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