Enhanced sensing based MWCNTS on interdigitated electrode (IDEs) biosensor von Farehanim, M. A., Hashim, U., Azizah, N., Fatin, M. F., Azman, A. H.

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Fabrication of interdigitated electrodes (IDEs) using basic conventional lithography for pH measurement von Farehanim, M. A., Hashim, U., Azizah, N., Fatin, M. F., Azman, A. H.

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Integrated titanium dioxide (TiO2) nanoparticles on interdigitated device electrodes (IDEs) for pH analysis von Azizah, N., Hashim, U., Arshad, M. K. Md, Gopinath, Subash C. B., Nadzirah, Sh, Farehanim, M. A., Fatin, M. F., Ruslinda, A. R., Ayub, R. M.

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Surface morphology of titanium dioxide (TiO2) nanoparticles on aluminum interdigitated device electrodes (IDEs) von Azizah, N., Hashim, U., Arshad, M. K. Md, Gopinath, Subash C. B., Nadzirah, Sh, Farehanim, M. A., Fatin, M. F., Ruslinda, A. R., Ayub, R. M.

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A Review of High-[kappa] Material for Biosensor Application von Norhafiezah, S, Ayub, R M, Arshad, Mohd Khairuddin Md, Azman, A H, Farehanim, M A, Hashim, U

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Investigated Effect of Points Charge of the Receptors on the Conduction of Semiconductor Nanowire von Al-Mufti, M. Wesam, Farehanim, M.A., Adam, Tijjani, Hashim, U., Rahman, Mijanur, Azman, A.H., Muaz, A.K.M.

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The Field Effect of Concentration DNA on Conductance of Silicon Nanowire von Al-Mufti, M. Wesam, Farehanim, M.A., Azman, A.H., Muaz, A.K.M., Hashim, U., Rahman, Mijanur, Adam, Tijjani, Ibraheam, A.S.

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Morphological and Electrical Properties of Silicon Dioxide-Based Interdigitated Electrode Arrays von Ramzan, Mat Ayub, Norhafiezah, S., Fatin, M.F., Hashim, U., Azman, A.H., Farehanim, M.A., Soin, Norhayati

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Fabrication of Aluminum Interdigitated Electrode for Biosensor Application Using Conventional Lithography von Ramzan, Mat Ayub, Fatin, M.F., Norhafizah, S., Hashim, U., Azman, A.H., Farehanim, M.A., Soin, Norhayati

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The Influence of Wafer Cleaning Process on the Silicon Surface Roughness von Azman, A.H., Md Arshad, Mohd Khairuddin, Norhafiezah, S., Farehanim, M.A., Hashim, U., Ramzan, Mat Ayub

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The Relation of Temperature Distribution on Silicon Wafer with Furnace Temperature and Gas Flow during Thermal Dry Oxidation Process von Md Arshad, Mohd Khairuddin, Al-Mufti, M. Wesam, Nurfaiz, M., Norhafizah, S., Kamarudin, M.Z., Azman, A.H., Md Nuzaihan, M.N., Farehanim, M.A., Hashim, U., Fathil, M.F.M., Ramzan, Mat Ayub

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