A Corrosion Inhibitor Test for Copper-Based Artifacts von Faltermeier, Robert B.

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A corrosion inhibitor test for copper-based artifacts von Faltermeier, Robert B.

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Corrosion inhibitor testing in archaeological conservation von Faltermeier, Robert B.

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Testing Corrosion Inhibitors for the Conservation of Archaeological Copper and Copper Alloys von Faltermeier, Robert B.

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Influence of different collagen species on physico-chemical properties of crosslinked collagen matrices von Angele, Peter, Abke, Jochen, Kujat, Richard, Faltermeier, Hubert, Schumann, Detlef, Nerlich, Michael, Kinner, Bernd, Englert, Carsten, Ruszczak, Zbigniew, Mehrl, Robert, Mueller, Rainer

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Aggressively Scaled Strained-Silicon-on-Insulator Undoped-Body High- \kappa/Metal-Gate nFinFETs for High-Performance Logic Applications von Maitra, K, Khakifirooz, A, Kulkarni, P, Basker, V S, Faltermeier, J, Jagannathan, H, Adhikari, H, Chun-Chen Yeh, Klymko, N R, Saenger, K, Standaert, T, Miller, R J, Doris, B, Paruchuri, V K, McHerron, D, O'Neil, J, Leobundung, E, Huiming Bu

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The majority of patients with resectable incidental lung cancers are ineligible for lung cancer screening von Zhou, Nanruoyi, Deng, John, Faltermeier, Claire, Peng, Terrance, Mandl, Hanna, Revels, Sha'shonda, Toste, Paul, Cameron, Robert B., Lee, Jay M., Yanagawa, Jane

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The majority of patients with resectable incidental lung cancers are ineligible for lung cancer screeningCentral MessagePerspective von Nanruoyi Zhou, MD, John Deng, BS, Claire Faltermeier, MD, PhD, Terrance Peng, MD, MPH, Hanna Mandl, BS, Sha'shonda Revels, MD, MS, Paul Toste, MD, Robert B. Cameron, MD, Jay M. Lee, MD, Jane Yanagawa, MD

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Opportunities and Challenges of FinFET as a Device Structure Candidate for 14nm Node CMOS Technology von Yamashita, Tenko, Basker, Veeraraghavan, Standaert, Theodorus, Yeh, Chun-Chen, Faltermeier, Johnathan, Yamamoto, Toyoji, Lin, Chung-hsun, Bryant, Andres, Maitra, Kingsuk, Kulkarni, Pranita, Kanakasabapathy, Sivananda, Sunamura, Hiroshi, Wang, Junli, Jagannathan, Hemanth, Inada, Atsuro, Cho, Jin, Miller, Robert, Doris, Bruce, Paruchuri, Vamsi, Bu, Huiming, Khare, Mukesh, O'Neill, James, Leobandung, Effendi

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Process and Electrical Characteristics of MO-ALD HfO2 Films for High-k Gate Applications Grown in a Production Worthy 300 mm Deposition System von Clark, Robert D., Wajda, Cory S., Leusink, Gert J., Edge, Lisa F., Faltermeier, Johnathan, Jamison, Paul, Linder, Barry P., Copel, Matthew, Narayanan, Vijay, Gribelyuk, Michael A., Loesing, Rainer, Murphy, Richard

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Corrosion inhibitor testing in archaeological conservation von Faltermeier, Robert

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