Metastable iron silicide phase formation by pulsed laser annealing von Comrie, C. M., Falepin, A., Richard, O., Bender, H., Vantomme, A.

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Superior N- and P-MOSFET scalability using carbon co-implantation and spike annealing von Augendre, E., Pawlak, B.J., Kubicek, S., Hoffmann, T., Chiarella, T., Kerner, C., Severi, S., Falepin, A., Ramos, J., De Keersgieter, A., Eyben, P., Vanhaeren, D., Vandervorst, W., Jurczak, M., Absil, P., Biesemans, S.

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Ultra-Shallow Junctions Formed By Sub-Melt Laser Annealing von Felch, S B, Falepin, A, Severi, S, Augendre, E, Hoffman, T, Noda, T, Parihar, V, Nouri, F, Schreutelkamp, R

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Study of concentration variations in the metastable [CsCl]Fe1-xSi phase von FALEPIN, A, COMRIE, C. M, COTTENIER, S, VANTOMME, A

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Direct Observation of the Self-Diffusion Mechanism on the Ag(100) Surface von Roşu, M. F., Laurens, C. R., Falepin, A., James, M. A., Langelaar, M. H., Pleiter, F., Rogojanu, O. C., Niesen, L.

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3D Pattern Effects in RTA Radiative vs Conductive Heating von Granneman, Ernst H., Terhorst, Herbert, Falepin, Annelies, Rosseel, Erik, Verheyden, Kurt, Vanormelingen, Koen, Bourdon, Helene, Halimaoui, Aomar, Funk, Klaus

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Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond von Luo, S., Mannaert, G., Shamiryan, Denis, Berry, Ivan L., Han, K., Falepin, A., Boullart, Werner, Sonnemans, R., Waldfried, Carlo, Witters, L.

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Study of concentration variations in the metastable [CsCl]Fe 1− xSi phase von Falepin, A, Comrie, C.M, Cottenier, S, Vantomme, A

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Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing von Felch, Susan B., Falepin, Annelies, Severi, Simone, Augendre, Emmanuel, Noda, Taiji, Parihar, Vijay, Nouri, Faran, Hoffmann, Tom, Pawlak, Bartek, Eyben, Pierre, Vandervorst, Wilfried, Thirupapuliyur, Sunderraj, Schreutelkamp, Robert, Collart, Erik, Graoui, Houda

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Ultra shallow junctions formed by sub-melt laser annealing von Falepin, A., Janssens, T., Severi, S., Vandervorst, W., Felch, S.B., Parihar, V., Mayur, A.

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Superior N- and PMOSFET scalability using carbon co-implantation and spike annealing von Augendre, E., De Keersgieter, A., Eyben, P., Vanhaeren, D., Vandervorst, W., Jurczak, M., Absil, P., Biesemans, S., Pawlak, B.J., Kubicek, S., Hoffmann, T., Chiarella, T., Kerner, C., Severi, S., Falepin, A., Ramos, J.

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Interpreting Mössbauer spectra reflecting an infinite number of sites: An application to Fe 1 − x Si synthesized by pulsed laser annealing von Falepin, A., Cottenier, S., Comrie, C. M., Vantomme, A.

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Interpreting Mössbauer spectra reflecting an infinite number of sites : an application to Fe1-xSi synthesized by pulsed laser annealing von Falepin, A, Cottenier, Stefaan, Comrie, CM, Vantomme, A

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Analysis of Dopant Diffusion and Defect Evolution during sub-millisecond Non-melt Laser Annealing based on an Atomistic Kinetic Monte Carlo Approach von Noda, T., Vandervorst, W., Felch, S., Parihar, V., Vrancken, C., Severi, S., Falepin, A., Janssens, T., Bender, H., Van Daele, H., Eyben, P., Niwa, M., Schreutelkamp, R., Nouri, F., Absil, P.P., Jurczak, M., De Meyer, K., Biesemans, S.

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Influence of the process sequence and thermal budget on the strain of Si:C stressor layers formed by ion implantation von Rosseel, E, Ortolland, C, Hikavyy, A, Schram, T, Falepin, A, Hoffmann, T, Douhard, B, Moussa, A, Vandervorst, W, Ameen, M, Rubin, L

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Implementation of molecular ion implant technology for PMOS extension implants and their compatibility with DRAM process flows von Falepin, A., Collart, E., Tran, S., Harris, M., Ameen, M., Hoffman, T., Rosseel, E., Saino, K., Horiguchi, N., Absil, P.

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A Ratiometric Readout Circuit for Thermal-Conductivity-Based Resistive CO2 Sensors von Zeyu Cai, van Veldhoven, Robert H. M., Falepin, Annelies, Suy, Hilco, Sterckx, Eric, Bitterlich, Christian, Makinwa, Kofi A. A., Pertijs, Michiel A. P.

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A Ratiometric Readout Circuit for Thermal-Conductivity-Based Resistive CO 2 Sensors von Cai, Zeyu, van Veldhoven, Robert H. M., Falepin, Annelies, Suy, Hilco, Sterckx, Eric, Bitterlich, Christian, Makinwa, Kofi A. A., Pertijs, Michiel A. P.

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Combination sensor von Falepin Annelies, Soccol Dimitri

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Combination sensor von DIMITRI SOCCOL, ANNELIES FALEPIN

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