Low-Temperature Al2O3 Atomic Layer Deposition von Groner, M. D, Fabreguette, F. H, Elam, J. W, George, S. M

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Ultra-low thermal conductivity in W/Al2O3 nanolaminates von COSTESCU, R. M, CAHILL, D. G, FABREGUETTE, F. H, SECHRIST, Z. A, GEORGE, S. M

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Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6 von FABREGUETTE, F. H, SECHRIST, Z. A, ELAM, J. W, GEORGE, S. M

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Multilayer and functional coatings on carbon nanotubes using atomic layer deposition von Herrmann, C. F., Fabreguette, F. H., Finch, D. S., Geiss, R., George, S. M.

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Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates von GRONER, M. D, ELAM, J. W, FABREGUETTE, Eh, GEORGE, S. M

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Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O von BURTON, B. B, FABREGUETTE, F. H, GEORGE, S. M

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Optimization and Structural Characterization of W/Al2O3 Nanolaminates Grown Using Atomic Layer Deposition Techniques von Sechrist, Z. A, Fabreguette, F. H, Heintz, O, Phung, T. M, Johnson, D. C, George, S. M

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Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3 von Wind, R. W., Fabreguette, F. H., Sechrist, Z. A., George, S. M.

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Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H(2)O von Burton, B B, Fabreguette, F H, George, S M

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Ultrahigh x-ray reflectivity from W∕Al2O3 multilayers fabricated using atomic layer deposition von Fabreguette, Francois H., Wind, Rikard A., George, Steven M.

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Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al 2 O 3 von Wind, R. W., Fabreguette, F. H., Sechrist, Z. A., George, S. M.

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Multilayer and functional coatings on carbon nanotubes using atomiclayer deposition von Herrmann, C. F., Fabreguette, F. H., Finch, D. S., Geiss, R., George, S. M.

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Optimization and Structural Characterization of W/Al 2 O 3 Nanolaminates Grown Using Atomic Layer Deposition Techniques von Sechrist, Z. A., Fabreguette, F. H., Heintz, O., Phung, T. M., Johnson, D. C., George, S. M.

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Ultra-Low Thermal Conductivity in W/Al 2 O 3 Nanolaminates von Costescu, R. M., Cahill, D. G., Fabreguette, F. H., Sechrist, Z. A., George, S. M.

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Ultra-low thermal conductivity in W/[Al.sub.2][O.sub.3] nanolaminates von Costescu, R.M, Cahill, D.G, Fabreguette, F. H, Sechrist, Z. A, George, S.M

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Ultra-Low Thermal Conductivity in$W/Al_{2}O_{3}$Nanolaminates von Costescu, R. M., Cahill, D. G., Fabreguette, F. H., Sechrist, Z. A., George, S. M.

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Ultra-Low Thermal Conductivity in W/Alsub 2 sub sub 3 Nanolaminates von Costescu, R M, Cahill, D G, Fabreguette, F H, Sechrist, Z A, George, S M

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Ultra-Low Thermal Conductivity in W/Al^sub 2^O^sub 3^ Nanolaminates von Costescu, R M, Cahill, D G, Fabreguette, F H, Sechrist, Z A, George, S M

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Low-Temperature Al 2 O 3 Atomic Layer Deposition von Groner, M. D., Fabreguette, F. H., Elam, J. W., George, S. M.

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Electrical characterization of thin Al sub(2)O sub(3) films grown by atomic layer deposition on silicon and various metal substrates von Groner, M D, Elam, J W, Fabreguette, F H, George, Steven M

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