The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition von Yasuoka, Tatsuya, Liu, Li, Ozaki, Tamako, Asako, Kanta, Ishikawa, Yuna, Fukue, Miyabi, Dang, Giang T., Kawaharamura, Toshiyuki

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Growth mechanism under the supply-limited regime in mist chemical vapor deposition: presumption of mist droplet state in high-temperature field von Kawaharamura, Toshiyuki, Nishi, Misaki, Liu, Li, Rutthongjan, Phimolphan, Ishikawa, Yuna, Sakamoto, Masahito, Yasuoka, Tatsuya, Asako, Kanta, Ozaki, Tamako, Fukue, Miyabi, Ueda, Mariko, Sato, Shota, Dang, Giang T.

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방열 기판, 방열 회로 기판, 방열 부재, 및 방열 기판의 제조 방법 von SATO KYOHEI, FUJIMURA TOSHINOBU, KAWAHARAMURA TOSHIYUKI, FUKUE MIYABI, IIZUKA MUNEAKI, NAKASATO KATSUMI, LIU LI

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HEAT DISSIPATION SUBSTRATE, HEAT DISSIPATION CIRCUIT BOARD, HEAT DISSIPATION MEMBER, AND METHOD FOR MANUFACTURING HEAT DISSIPATION SUBSTRATE von FUJIMURA, Toshinobu, NAKASATO, Katsumi, LIU, Li, IIZUKA, Muneaki, KAWAHARAMURA, Toshiyuki, SATO, Kyohei, FUKUE, Miyabi

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