Novel Molecular Resist for EUV and Electron Beam Lithography von Frommhold, Andreas, Yang, Dongxu, McClelland, Alexandra, Roth, John, Xue, Xiang, Rosamund, Mark C., Linfield, Edmund H., Robinson, Alex P. G.

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Effect of film structure on the electrochemical properties of gold electrodes for neural implants von Frommhold, Andreas, Tarte, Edward

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Understanding the Significance of Local Variability in Defect-Aware Process Windows von Maslow, Mark John, Yaegashi, Hidetami, Frommhold, Andreas, Hara, Arisa, Cerbu, Dorin

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Mask innovations on the eve of high NA EUV lithography von Philipsen, Vicky, Frommhold, Andreas, Thakare, Devesh, Libeert, Guillaume, Lee, Inhwan, Franke, Joern-Holger, Bekaert, Joost, Van Look, Lieve, Pellens, Nick, De Bisschop, Peter, Jonckheere, Rik, Kovalevich, Tatiana, Wiaux, Vincent, Hendrickx, Eric

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Mask innovations on the eve of high NA EUV lithography von Philipsen, Vicky, Frommhold, Andreas, Thakare, Devesh, Libeert, Guillaume, Lee, Inhwan, Franke, Joern-Holger, Bekaert, Joost, Van Look, Lieve, Pellens, Nick, De Bisschop, Peter, Jonckheere, Rik, Kovalevich, Tatiana, Wiaux, Vincent, Hendrickx, Eric

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Residual stress analysis of all perovskite oxide cantilevers von Vasta, Giuseppe, Jackson, Timothy J., Frommhold, Andreas, Bowen, James, Tarte, Edward J.

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A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures von Yang, Dongxu, Chen, Xiangyi, He, Dongsheng, Frommhold, Andreas, Shi, Xiaoqing, Boden, Stuart A, Lebedeva, Maria A, Ershova, Olga V, Palmer, Richard E, Li, Ziyou, Shi, Haofei, Gao, Jianzhi, Pan, Minghu, Khlobystov, Andrei N, Chamberlain, Thomas W, Robinson, Alex P. G

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High aspect ratio silicon and polyimide nanopillars by combination of nanosphere lithography and intermediate mask pattern transfer von Frommhold, Andreas, Robinson, Alex P.G., Tarte, Edward

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Residual stress analysis of all perovskite oxide cantilevers von Vasta, Giuseppe, Jackson, Timothy J., Frommhold, Andreas, Bowen, James, Tarte, Edward J.

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Nanotexturisation of gold surfaces and its application to neural implants von Frommhold, Andreas

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Sensitivity Enhanced Photoresists von FROMMHOLD, Andreas, ROBINSON, Alex P.G, ROTH, John

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SENSITIVITY ENHANCED PHOTORESISTS von FROMMHOLD, Andreas, ROBINSON, Alex, ROTH, John

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Multiple trigger monomer containing photoresist compositions and method von McClelland, Alexandra, Ure, David, Robinson, Alex Philip Graham, Frommhold, Andreas, Roth, John, Yang, Dongxu

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Spiral peripheral nerve interface; updated fabrication process of the regenerative implant von Barrett, Richard, Benmerah, Samia, Frommhold, Andreas, Tarte, Edward

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Enhanced EUV photoresist materials, formulations and processes von McClelland, Alexandra, Lada, Tom, Robinson, Alex P. G, Frommhold, Andreas, Jackson, Edward, Roth, John, O'Callahan, Greg, Popescu, Carmen

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SENSITIVITY ENHANCED PHOTORESISTS von Robinson, Alex Phillip Graham, Frommhold, Andreas, Roth, John

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Enhanced EUV Photoresist Materials, Formulations and Processes von McClelland, Alexandra, Lada, Tom, Robinson, Alex P. G, Frommhold, Andreas, Jackson, Edward, Roth, John, O'Callahan, Greg, Popescu, Carmen

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MULTIPLE TRIGGER MONOMER CONTAINING PHOTORESIST COMPOSITIONS AND METHOD von McClelland, Alexandra, Ure, David, Robinson, Alex Philip Graham, Frommhold, Andreas, Roth, John, Yang, Dongxu

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MULTIPLE TRIGGER MONOMER CONTAINING PHOTORESIST COMPOSITIONS AND METHOD von FROMMHOLD, Andreas, URE, David, ROBINSON, Alex, YANG, Dongxu, MCCLELLAND, Alexandra, ROTH, John

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Multiple trigger monomer containing photoresist compositions and method von YANG, DONGXU, ROTH, JOHN, URE, DAVID, ROBINSON, ALEX PHILLIP GRAHAM, MCCLELLAND, ALEXANDRA, FROMMHOLD, ANDREAS

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