Quantum states of neutrons in the Earth's gravitational field von Nesvizhevsky, Valery V, Börner, Hans G, Petukhov, Alexander K, Abele, Hartmut, Baeßler, Stefan, Rueß, Frank J, Stöferle, Thilo, Westphal, Alexander, Gagarski, Alexei M, Petrov, Guennady A, Strelkov, Alexander V

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Realization of Atomically Controlled Dopant Devices in Silicon von Rueß, Frank J., Pok, Wilson, Reusch, Thilo C. G., Butcher, Matthew J., Goh, Kuan Eng J., Oberbeck, Lars, Scappucci, Giordano, Hamilton, Alex R., Simmons, Michelle Y.

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Toward Atomic-Scale Device Fabrication in Silicon Using Scanning Probe Microscopy von Ruess, Frank J, Oberbeck, Lars, Simmons, Michelle Y, Goh, Kuan Eng J, Hamilton, Alex R, Hallam, Toby, Schofield, Steven R, Curson, Neil J, Clark, Robert G

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Confinement and integration of magnetic impurities in silicon von Rueß, Frank J., El Kazzi, Mario, Czornomaz, Lukas, Mensch, Philipp, Hopstaken, Marinus, Fuhrer, Andreas

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One-dimensional conduction properties of highly phosphorus-doped planar nanowires patterned by scanning probe microscopy von Rueß, Frank J., Weber, Bent, Goh, Kuan Eng J., Klochan, Oleh, Hamilton, Alex R., Simmons, Michelle Y.

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Demonstration of gating action in atomically controlled Si:P nanodots defined by scanning probe microscopy von Rueß, Frank J., Scappucci, Giordano, Füchsle, Martin, Pok, Wilson, Fuhrer, Andreas, Thompson, Daniel L., Reusch, Thilo C.G., Simmons, Michelle Y.

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Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy–patterned devices von Fuechsle, Martin, Rueß, Frank J., Reusch, Thilo C. G., Mitic, Mladen, Simmons, Michelle Y.

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Electrical Characterization of Ordered Si:P Dopant Arrays von Pok, W., Reusch, T.C.G., Scappucci, G., Rueb, F.J., Hamilton, A.R., Simmons, M.Y.

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Atomically controlled device fabrication using STM von Ruess, Frank Joachim

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FABRICATING NANOSCALE AND ATOMIC SCALE DEVICES von SIMMONS, Michelle Yvonne, OBERBECK, Lars, GOH, K. E. Johnson, CURSON, Neil Jonathan, MITIC, Mladen, BRENNER, Rolf, HALLAM, Toby, RUESS, Frank J, HAMILTON, Alexander Rudolf

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FABRICATION OF ATOMIC SCALE DEVICES von WEBER, Bent, REUSCH, Thilo, Curd, Gerhard, SIMMONS, Michelle, Yvonne, FUHRER, Andreas, POK, Wilson, FUECHSLE, Martin, RUESS, Frank

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Fabrication of atomic scale devices von WEBER, BENT, POK, WILSON, FUECHSLE, MARTIN, FUHRER, ANDREAS, RUESS, FRANK, SIMMONS, MICHELLE YVONNE, REUSCH, THILO CURD GERHARD

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FABRICATION OF ATOMIC SCALE DEVICES von WEBER, BENT, POK, WILSON, FUHRER, ANDREAS, FUECHSLE, MARTIN, RUESS, FRANK, SIMMONS, MICHELLE, YVONNE, REUSCH, THILO, CURD, GERHARD

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Fabrication of atomic scale devices von SIMMONS MICHELLE YVONNE, WEBER BENT, RUESS FRANK, FUHRER ANDREAS, REUSCH THILO CURD GERHARD, POK WILSON, FUECHSLE MARTIN

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Fabrication of Atomic Scale Devices von SIMMONS MICHELLE YVONNE, WEBER BENT, RUESS FRANK, FUHRER ANDREAS, REUSCH THILO CURD GERHARD, POK WILSON, FUECHSLE MARTIN

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FABRICATION OF ATOMIC SCALE DEVICES von WEBER, BENT, POK, WILSON, FUHRER, ANDREAS, FUECHSLE, MARTIN, RUESS, FRANK, SIMMONS, MICHELLE, YVONNE, REUSCH, THILO, CURD, GERHARD

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Atomically precise silicon device fabrication von Simmons, M.Y., Ruess, F.J., Pok, W., Thompson, D.L., Fuchsle, M., Scappucci, G., Reusch, T.C.G., Goh, K.-E.J., Schofield, S.R., Weber, B., Oberbeck, L., Hamilton, A.R., Ratto, F.

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FABRICATION OF ATOMIC SCALE DEVICES von WEBER, BENT, POK, WILSON, FUHRER, ANDREAS, FUECHSLE, MARTIN, RUESS, FRANK, SIMMONS, MICHELLE, YVONNE, REUSCH, THILO, CURD, GERHARD

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Fabrication of atomic scale devices von MICHELLE YVONNE SIMMONS, THILO CURD GERHARD REUSCH, MARTIN FUECHSLE, WILSON POK, FRANK RUESS, ANDREAS FUHRER, BENT WEBER

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FABRICATING NANOSCALE AND ATOMIC SCALE DEVICES von RUESS, FRANK, J, HAMILTON, ALEXANDER, RUDOLF, MITIC, MLADEN, CURSON, NEIL, JONATHAN, BRENNER, ROLF, SIMMONS, MICHELLE, YVONNE, GOH, K. E. JOHNSON, OBERBECK, LARS, HALLAM, TOBY

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