Effect of scandium content on structure and piezoelectric properties of AlScN films deposited by reactive pulse magnetron sputtering von Zywitzki, Olaf, Modes, Thomas, Barth, Stephan, Bartzsch, Hagen, Frach, Peter

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Sputter deposition of stress-controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications von Barth, Stephan, Bartzsch, Hagen, Gloess, Daniel, Frach, Peter, Herzog, Thomas, Walter, Susan, Heuer, Henning

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Bipolar pulsed reactive magnetron sputtering of epitaxial AlN- films on Si(111) utilizing a technology suitable for 8″ substrates von Neuhaus, Stefan, Bartzsch, Hagen, Cornelius, Steffen, Pingen, Katrin, Hinz, Alexander, Frach, Peter

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Time-Sequential Working Wavelength-Selective Filter for Flat Autostereoscopic Displays von Barré, René, Bartmann, Roland, Jurk, Silvio, Kuhlmey, Mathias, Duckstein, Bernd, Seeboth, Arno, Lötzsch, Detlef, Rabe, Christian, Frach, Peter, Bartzsch, Hagen, Gittner, Matthias, Bruns, Stefan, Schottner, Gerhard, Fischer, Johanna

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Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 °C von Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Schultheiß, Eberhard, Brode, Wolfgang, Hartung, Johannes

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Magnetron sputtering of piezoelectric AlN and AlScN thin films and their use in energy harvesting applications von Barth, Stephan, Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Modes, Thomas, Zywitzki, Olaf, Suchaneck, Gunnar, Gerlach, Gerald

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Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode von Barth, Stephan, Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Labitzke, Rainer

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Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the fabrication of nanorod arrays von Barth, Stephan, Derenko, Susan, Bartzsch, Hagen, Zywitzki, Olaf, Modes, Thomas, Patrovsky, Fabian, Fiehler, Vera, Uhlig, Tino, Frach, Peter, Eng, Lukas M.

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Synthesis and deposition of metal nanoparticles by gas condensation process von Maicu, Marina, Schmittgens, Ralph, Hecker, Dominic, Glöß, Daniel, Frach, Peter, Gerlach, Gerald

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Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films von Kon, Masato, Song, Pung Keun, Shigesato, Yuzo, Frach, Peter, Ohno, Shingo, Suzuki, Koichi

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Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition von Taeschner, Kerstin, Bartzsch, Hagen, Frach, Peter, Schultheiss, Eberhard

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Al-Doped ZnO Films Deposited by Reactive Magnetron Sputtering in Mid-Frequency Mode with Dual Cathodes von Kon, Masato, Song, Pung Keun, Shigesato, Yuzo, Frach, Peter, Mizukami, Akio, Suzuki, Koichi

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Sputter deposition of silicon oxynitride gradient and multilayer coatings von Weber, Jörn, Bartzsch, Hagen, Frach, Peter

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Anodization of sputtered substoichiometric aluminum oxide thin-films for improved nanorod array fabrication von Patrovsky, Fabian, Fiehler, Vera, Derenko, Susan, Barth, Stephan, Bartzsch, Hagen, Ortstein, Katrin, Frach, Peter, Eng, Lukas M

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Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature von Glöß, D., Frach, P., Zywitzki, O., Modes, T., Klinkenberg, S., Gottfried, C.

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Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings von Frach, Peter, Gloess, Daniel, Bartzsch, Hagen, Taeschner, Kerstin, Liebig, Joern, Schultheiss, Eberhard

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Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications von Barth, Stephan, Bartzsch, Hagen, Gloess, Daniel, Frach, Peter, Herzog, Thomas, Walter, Susan, Heuer, Henning

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Electrical insulation properties of sputter‐deposited SiO 2 , Si 3 N 4 and Al 2 O 3 films at room temperature and 400 °C von Bartzsch, Hagen, Glöß, Daniel, Frach, Peter, Gittner, Matthias, Schultheiß, Eberhard, Brode, Wolfgang, Hartung, Johannes

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Pulse Magnetron Sputtering with high power density – an attempt at a critical evaluation von Frach, Peter, Gottfried, Christian, Fietzke, Fred, Klostermann, Heidrun, Bartzsch, Hagen, Glöß, Daniel

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High Rate Reactive Sputter Deposition of TiO 2 Films for Photocatalyst and Dye-Sensitized Solar Cells von Sato, Yasushi, Hashimoto, Takahiro, Miyamura, Amica, Ohno, Singo, Oka, Nobuto, Suzuki, Koichi, Glöß, Daniel, Frach, Peter, Shigesato, Yuzo

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