On the role of oxygen and hydrogen in diamond-forming discharges von MUCHA, J. A, FLAMM, D. L, IBBOTSON, D. E

Volltext

Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas von Flamm, D. L.

Volltext

Diamond crystal growth by plasma chemical vapor deposition von CHANG, C.-P, FLAMM, D. L, IBBOTSON, D. E, MUCHA, J. A

Volltext

Anisotropic etching of SiO2 in low-frequency CF4/O2 and NF3/Ar plasmas von DONNELLY, V. M, FLAMM, D. L, DAUTREMONT-SMITH, W. C, WERDER, D. J

Volltext

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas von Mogab, C. J., Adams, A. C., Flamm, D. L.

Volltext

Plasmaless dry etching of silicon with fluorine-containing compounds von IBBOTSON, D. E, MUCHA, J. A, FLAMM, D. L, COOK, J. M

Volltext

The plasma oxidation of CF4 in a tubular-alumina fast-flow reactor von Smolinsky, G., Flamm, D. L.

Volltext

Hydrogen passivation of point defects in silicon von Benton, J. L., Doherty, C. J., Ferris, S. D., Flamm, D. L., Kimerling, L. C., Leamy, H. J.

Volltext

Selective interhalogen etching of tantalum compounds and other semiconductor materials von IBBOTSON, D. E, MUCHA, J. A, FLAMM, D. L, COOK, J. M

Volltext

Computer simulation of a CF4 plasma etching silicon von EDELSON, D, FLAMM, D. L

Volltext

Operation of a helical resonator plasma source von Niazi, K, Lichtenberg, A J, Lieberman, M A, Flamm, D L

Volltext

Comparison of XeF2 and F-atom reactions with Si and SiO2 von IBBOTSON, D. E, FLAMM, D. L, MUCHA, J. A, DONNELLY, V. M

Volltext

Ion dynamics of rf plasmas and plasma sheaths: a time-resolved spectroscopic study von GOTTSCHO, R. A, BURTON, R. H, FLAMM, D. L, DONNELLY, V. M, DAVIS, G. P

Volltext

Crystallographic etching of GaAs with bromine and chlorine plasmas von IBBOTSON, D. E, FLAMM, D. L, DONNELLY, V. M

Volltext

The etching of doped polycrystalline silicon by molecular chlorine von OGRYZLO, E. A, FLAMM, D. L, IBBOTSON, D. E, MUCHA, J. A

Volltext

Temperature Dependence of InP and GaAs Etching in a Chlorine Plasma von Donnelly, V. M., Flamm, D. L., Tu, C. W., Ibbotson, D. E.

Volltext

Copper-catalyzed etching of silicon by F2: kinetics and feature morphology von NUR SELAMOGLU, MUCHA, J. A, FLAMM, D. L, IBBOTSON, D. E

Volltext

Catalyzed gaseous etching of silicon von NUR SELAMOGLU, MUCHA, J. A, FLAMM, D. L, IBBOTSON, D. E

Volltext

Reaction of fluorine atoms with SiO2 von Flamm, D. L., Mogab, C. J., Sklaver, E. R.

Volltext

Chemiluminescence and the reaction of molecular fluorine with silicon von Mucha, J. A, Donnelly, V. M, Flamm, D. L, Webb, L. M

Volltext