Rapid and precise scanning helium ion microscope milling of solid-state nanopores for biomolecule detection von Yang, Jijin, Ferranti, David C, Stern, Lewis A, Sanford, Colin A, Huang, Jason, Ren, Zheng, Qin, Lu-Chang, Hall, Adam R

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Neon Ion Beam Lithography (NIBL) von Winston, Donald, Manfrinato, Vitor R, Nicaise, Samuel M, Cheong, Lin Lee, Duan, Huigao, Ferranti, David, Marshman, Jeff, McVey, Shawn, Stern, Lewis, Notte, John, Berggren, Karl K

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Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope von Scipioni, Larry, Ferranti, David C., Smentkowski, Vincent S., Potyrailo, Radislav A.

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Rapid and precise scanning helium ion microscope milling of solid-state nanopores for biomolecule detection von Yang, Jijin, Ferranti, David C., Stern, Lewis A., Sanford, Colin A., Huang, Jason, Ren, Zheng, Qin, Lu-Chang, Hall, Adam R.

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Nanopore Fabrication And Applications Thereof von SANFORD COLIN, YANG JIJIN, HALL ADAM R, FERRANTI DAVID C

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Nanopore fabrication and applications thereof von YANG JIJIN, SANFORD COLIN A, HALL ADAM R, FERRANTI DAVID C

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NANOPORE FABRICATION AND APPLICATIONS THEREOF von HALL, ADAM, R, YANG, JIJIN, FERRANTI, DAVID, C, SANFORD, COLIN, A

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Excimer laser processing of magneto-optic garnet films von BELT, R. F, INGS, J. B, FERRANTI, D. C, WIGEN, P. E

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NANOPORE FABRICATION AND APPLICATIONS THEREOF von HALL, ADAM, R, YANG, JIJIN, FERRANTI, DAVID, C, SANFORD, COLIN, A

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Excimer laser processing of magnetooptic garnet films von Belt, Roger F, Ings, John B, Ferranti, David C

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REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE von SMITH, GERALD, FERRANTI, DAVID, C, MUSIL, CHRISTIAN R, RAY, VALERY

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Sub-micron lithography at 248nm and 193nm excimer laser wavelengths von Elliott, David J., Ferranti, David C.

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REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE von MUSIL CHRISTIAN R, RAY VALERY, FERRANTI DAVID C, SMITH GERALD

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REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE von SMITH, GERALD, FERRANTI, DAVID, C, MUSIL, CHRISTIAN R, RAY, VALERY

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USING SCANNING PROBE MICROSCOPE TOPOGRAPHIC DATA TO REPAIR PHOTOMASK DEFECT USING CHARGED PARTICLE BEAMS von SMITH, GERALD, FERRANTI, DAVID, C, MUSIL, CHRISTIAN, R, RAY, VALERY

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Method and apparatus for repairing lithography masks using a charged particle beam system von Ferranti, David C, Szelag, Sharon M, Casey, Jr., J. David

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Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope von MUSIL CHRISTIAN R, RAY VALERY, FERRANTI DAVID C, SMITH GERALD

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METHOD FOR REPAIRING LITHOGRAPHY MASKS USING A CHARGED PARTICLE BEAM SYSTEM von FERRANTI, DAVID, C, CASEY, JAMES, DAVID, JR, SZELAG, SHARON, M

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Using scanning probe microscope topographic data to repair photomask defect using charged particle beams von VALERY RAY, DAVID C. FERRANTI, GERALD SMITH, CHRISTIAN R. MUSIL

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REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE von VALERY RAY, GERALD SMITH, CHRISTIAN, R. MUSIL, DAVID, C. FERRANTI

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