Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography von Feng, Yaobin, Liu, Jiamin, Jiang, Hao, Liu, Shiyuan

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Machine Learning based Optical Proximity Correction Techniques von Yuan, Pengpeng, Fan, Taian, Feng, Yaobin, Xu, Peng, Wei, Yayi

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Zernike model for overlay control and tool monitor for lithography and etch process von Zhang, Libin, Feng, Yaobin, Song, Zhen, Yang, Shang, Wei, Yayi

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Layout pattern analysis and coverage evaluation in computational lithography von Feng, Yaobin, Song, Zhiyang, Liu, Jiaman, Li, Zhiqin, Yang, Feng, Jiang, Hao, Liu, Shiyuan

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Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer von Feng, Yaobin, Liu, Jiamin, Song, Zhiyang, Jiang, Hao, Liu, Shiyuan

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Overlay control solution for high aspect ratio etch process induced overlay error von Ma, Enze, Zhang, Libin, Feng, Yaobin, Ma, Le, Zhang, Shixin, Wei, Yayi

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Systems and methods for evaluating critical dimensions based on diffraction-based overlay metrology von Feng, Yaobin

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Systems and methods for evaluating critical dimensions based on diffraction-based overlay metrology von Feng, Yaobin

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SYSTEMS AND METHODS FOR EVALUATING CRITICAL DIMENSIONS BASED ON DIFFRACTION-BASED OVERLAY METROLOGY von Feng, Yaobin

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SYSTEMS AND METHODS FOR EVALUATING CRITICAL DIMENSIONS BASED ON DIFFRACTION-BASED OVERLAY METROLOGY von Feng, Yaobin

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SYSTEMS AND METHODS FOR EVALUATING CRITICAL DIMENSIONS BASED ON DIFFRACTION-BASED OVERLAY METROLOGY von FENG, Yaobin

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Classification, Parameter Estimation and State Estimation: An Engineering Approach Using MATLAB von Bangjun Lei, Guangzhu Xu, Ming Feng, Yaobin Zou, Ferdinand van der Heijden, Dick de Ridder, David M. J. Tax

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System and method for evaluating the critical dimension of semiconductor element von FENG, YAOBIN

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System and method for evaluating the critical dimension of semiconductor element von FENG, YAOBIN

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Method for improving registration accuracy von FENG YAOBIN

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Method for improving registering precision of wafer product von FENG YAOBIN

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Rare earth permanent magnetic material drying device von FENG YAOBIN

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Systems and methods for evaluating critical dimensions based on diffraction-based overlay metrology von FENG YAOBIN

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Method and system of using monitoring photomask von FENG YAOBIN

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OPENINGS LAYOUT OF THREE-DIMENSIONAL MEMORY DEVICE von Xia, Zhiliang, Feng, Yaobin, Liu, Fandong, Cao, Qingchen, Yang, Yaohua, Hong, Peizhen, He, Jia, Chen, Baoyou, Huang, Haihui, Huo, Zongliang

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