Low-Temperature Al2O3 Atomic Layer Deposition von Groner, M. D, Fabreguette, F. H, Elam, J. W, George, S. M

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Ultra-low thermal conductivity in W/Al2O3 nanolaminates von COSTESCU, R. M, CAHILL, D. G, FABREGUETTE, F. H, SECHRIST, Z. A, GEORGE, S. M

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Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O von BURTON, B. B, FABREGUETTE, F. H, GEORGE, S. M

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Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates von GRONER, M. D, ELAM, J. W, FABREGUETTE, Eh, GEORGE, S. M

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Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6 von FABREGUETTE, F. H, SECHRIST, Z. A, ELAM, J. W, GEORGE, S. M

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Multilayer and functional coatings on carbon nanotubes using atomic layer deposition von Herrmann, C. F., Fabreguette, F. H., Finch, D. S., Geiss, R., George, S. M.

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Optimization and Structural Characterization of W/Al2O3 Nanolaminates Grown Using Atomic Layer Deposition Techniques von Sechrist, Z. A, Fabreguette, F. H, Heintz, O, Phung, T. M, Johnson, D. C, George, S. M

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Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS von GUILLOT, J, FABREGUETTE, F, IMHOFF, L, HEINTZ, O, DE LUCAS, M. C, SACILOTTI, M, DOMENICHINI, B, BOURGEOIS, S

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X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001) von Chiaramonte, Th, Abramof, E., Fabreguette, F., Sacilotti, M., Cardoso, L.P.

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Cathodoluminescence and structural studies of nitrided 3D gallium structures grown by MOCVD von Chiaramonte, Th, Romero, Manuel J., Fabreguette, F., Cardoso, L.P., Sacilotti, M.

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Nucleation period, surface roughness, and oscillations in mass gain per cycle during W atomic layer deposition on Al2O3 von Wind, R. W., Fabreguette, F. H., Sechrist, Z. A., George, S. M.

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Thermal effects on the growth by metal organic chemical vapour deposition of TiO2 thin films on (100) GaAs substrates von Brevet, A., Fabreguette, F., Imhoff, L., Marco de Lucas, M.C., Heintz, O., Saviot, L., Sacilotti, M., Bourgeois, S.

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Temperature and substrate influence on the structure of TiNxOy thin films grown by low pressure metal organic chemical vapour deposition von Fabreguette, F., Imhoff, L., Guillot, J., Domenichini, B., Marco de Lucas, M.C., Sibillot, P., Bourgeois, S., Sacilotti, M.

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Structure and properties of GaNxOy films grown by nitridation of GaAs (1 0 0) substrates von DE LUCAS, M. C, FABREGUETTE, F, LINSAVANH, M, IMHOFF, L, HEINTZ, O, JOSSE-COURTY, C, MESNIER, M. T, POTIN, V, BOURGEOIS, S, SACILOTTI, M

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Structural characterization of TiO2/TiN O (δ-doping) heterostructures on (1 1 0)TiO2 substrates von Chiaramonte, T, Cardoso, L.P, Gelamo, R.V, Fabreguette, F, Sacilotti, M, Marco de Lucas, M.C, Imhoff, L, Bourgeois, S, Kihn, Y, Casanove, M.-J

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Anisotropic and non-heterogeneous continuum percolation in titanium oxynitride thin columnar films von Fabreguette, F, Maglione, M, Clerc, J P, Bourgeois, S, Sacilotti, M

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Structural characterization of TiNxOy/TiO2 single crystalline and nanometric multilayers grown by LP-MOCVD on (110)TiO2 von FABREGUETTE, F, GUILLOT, J, CARDOSO, L. P, MARCON, R, IMHOFF, L, DE LUCAS, M. C, SIBILLOT, P, BOURGEOIS, S, DUFOUR, P, SACILOTTI, M

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Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H(2)O von Burton, B B, Fabreguette, F H, George, S M

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Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures von Fabreguette, F., Imhoff, L., Maglione, M., Domenichini, B., Marco de Lucas, M. C., Sibillot, P., Bourgeois, S., Sacilotti, M.

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Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth von Fabreguette, F., Imhoff, L., Heintz, O., Maglione, M., Domenichini, B., Marco de Lucas, M.C., Sibillot, P., Bourgeois, S., Sacilotti, M.

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