Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool von Eitoku, Atsuro, Snow, James, Sato, M., Imai, M., Nakajima, Kazuo, Mertens, Paul W., Vos, Rita, Hirae, S., Nonomura, M., Heyns, Marc

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Relationship between Atmospheric Humidity and Watermark Formation in IPA Dry of Si Wafer after HF Clean von Eitoku, Atsuro, Kurumoto, N., Miya, Katsuhiko

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New Wet Process Strategies for Reduced La 2 O 3 and MgO 2 High-k Cap-dielectric Loss von Wada, Masayuki, Vos, Rita, Claes, Martine, Schram, Tom, Snow, Jim, Mertens, Paul, Eitoku, Atsuro

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All Wet Photoresist Strip by Solvent Aerosol Spray von Eitoku, Atsuro, Snow, James, Mertens, Paul W., Wada, Masayuki, Leunissens, L.H.A., Vos, Rita, Sano, Kenichi

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Study of Static Electricity in Wafer Cleaning Process von Hayashi, N., Eitoku, Atsuro, Wada, Masayuki, Takahashi, H., Sueto, T.

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Substrate processing apparatus and substrate processing method von Eitoku, Atsuro, Emoto, Tetsuya, Iwata, Tomomi

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Aging Phenomena in the Removal of Nano-Particles from Si Wafers von Eitoku, Atsuro, Snow, James, Arnauts, Sophia, Vereecke, Guy, Xu, Kai Dong, Mertens, Paul W., Veltens, J., Sano, Kenichi, Vinckier, Chris, Kenis, Karine

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Damage Clustering and Damage-Size Distributions After Megasonic Cleaning von De Marco, Cinzia, Wostyn, Kurt L., Bearda, Twan, Sano, Ken-Ichi, Kenis, Karine, Janssens, Tom, Leunissen, Leonardus H.A., Eitoku, Atsuro, Mertens, P.

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Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process von Eitoku, Atsuro, Loo, Roger, Snow, James, Leys, Frederik E., Izumi, Akira, Miya, Katsuhiko, Mertens, Paul W., Wada, Masayuki, Sano, Kenichi, Hikavyy, Andriy

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Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning von Wostyn, Kurt L., Sano, Ken-Ichi, Eitoku, Atsuro, Janssens, Tom, Bearda, Twan, Leunissen, Leonardus H.A., Mertens, P.

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SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE von EMOTO, Tetsuya, ENDO, Toru, EITOKU, Atsuro

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Substrate processing method and substrate processing device von EITOKU, ATSURO, ENDO, TORU, EMOTO, TETSUYA

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Impact of Galvanic Corrosion on Metal Gate Stacks von Eitoku, Atsuro, Garaud, Sylvain, Snow, James, Collaert, Nadine, Mertens, Paul W., Wada, Masayuki, Leunissens, L.H.A., Vos, Rita, Sano, Kenichi, Ferain, I.

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Substrate processing method and substrate processing apparatus von EITOKU ATSURO

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Substrate processing method and substrate processing apparatus von Eitoku, Atsuro

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Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic von Eitoku, Atsuro, Snow, James, Vereecke, Guy, Veltens, T., Wostyn, Kurt, Mertens, Paul W., Fyen, Wim, Sano, Kenichi, Doumen, G.

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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD von EMOTO, Tetsuya, EITOKU, Atsuro, IWATA, Tomomi

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Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe von Eitoku, Atsuro, Dilliway, G., Loo, Roger, Snow, James, Leys, Frederik E., Izumi, Akira, Mertens, Paul W., Sano, Kenichi

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Substrate processing apparatus and substrate processing method von Eitoku, Atsuro, Emoto, Tetsuya, Iwata, Tomomi

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Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer von Eitoku, Atsuro, Richard, O., Conard, Thierry, Snow, James, Izumi, Akira, Kubicek, S., Mertens, Paul W., Singanamalla, R., Vos, Rita, Sano, Kenichi, Nyns, L.

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