Synthesis and Reactivity of (Pentamethylcyclopentadienyl)ruthenium Complexes of the Stable Neutral Silylene Si(tBuNCHCHNtBu) von Dysard, Jeffrey M, Tilley, T. Don

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Tantalum-Mediated Substitution at Germanium:  A Germolyl-to-Germole Transformation Leading to η4-C4Me4GeMeCl Complexes von Dysard, Jeffrey M, Tilley, T. Don

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Synthesis and Reactivity of η5-Silolyl, η5-Germolyl, and η5-Germole Dianion Complexes of Zirconium and Hafnium von Dysard, Jeffrey M, Tilley, T. Don

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Synthesis and Reactivity of η5-Germacyclopentadienyl Complexes of Iron von Freeman, William P, Dysard, Jeffrey M, Tilley, T. Don, Rheingold, Arnold L

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η5-Silolyl and η5-Germolyl Complexes of d0 Hafnium. Structural Characterization of an η5-Silolyl Complex von Dysard, Jeffrey M, Tilley, T. Don

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Silabenzene and Disilabenzene Complexes of Ruthenium von Dysard, Jeffrey M, Tilley, T. Don, Woo, Tom K

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Hafnium−Rhodium and Hafnium−Iridium Heterobimetallic Complexes Featuring the Bridging Germole Dianion Ligand [GeC4Me4]2 von Dysard, Jeffrey M, Tilley, T. Don

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CMP Solutions for the Integration of High-K Metal Gate Technologies von Dysard, Jeffrey M., Brusic, Vlasta, Feeney, Paul, Grumbine, Steven, Moeggenborg, Kevin, Whitener, Glenn, Ward, William, Burns, Gregory, Choi, Kyose

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Tantalum-Mediated Substitution at Germanium:  A Germolyl-to-Germole Transformation Leading to η 4 -C 4 Me 4 GeMeCl Complexes von Dysard, Jeffrey M., Tilley, T. Don

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Synthesis and Reactivity of η 5 -Silolyl, η 5 -Germolyl, and η 5 -Germole Dianion Complexes of Zirconium and Hafnium von Dysard, Jeffrey M., Tilley, T. Don

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η 5 -Silolyl and η 5 -Germolyl Complexes of d 0 Hafnium. Structural Characterization of an η 5 -Silolyl Complex von Dysard, Jeffrey M., Tilley, T. Don

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Synthesis and Reactivity of η 5 -Germacyclopentadienyl Complexes of Iron von Freeman, William P., Dysard, Jeffrey M., Tilley, T. Don, Rheingold, Arnold L.

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Composition and method to polish silicon nitride von DYSARD JEFFREY M, CHEN ZHAN, VACASSY ROBERT, CARTER PHILLIP W

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Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios von JOHNS TIMOTHY P, DYSARD JEFFREY M

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Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios von Dysard, Jeffrey M, Johns, Timothy P

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SELECTIVE NAPHTHA HYDRODESULFURIZATION WITH HIGH TEMPERATURE MERCAPTAN DECOMPOSITION von DYSARD, JEFFREY M, ELLIS, EDWARD STANLEY, GREELEY, JOHN PETER, TRACY, WILLIAM JOSEPH, III, HALBERT, THOMAS RISHER

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Reactions of [W(NH=NR)(CO) 2(PPh 3) 2 +][PF 6 −] with azide and amines that occur without displacement of the NH=NR ligand von Cheng, Tan-Yun, Smith, Milton R., Dysard, Jeffrey M., Ali, Janann Y., Hillhouse, Gregory L.

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Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios von JOHNS TIMOTHY P, DYSARD JEFFREY M

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Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios von JOHNS TIMOTHY P, DYSARD JEFFREY M

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Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios von Dysard, Jeffrey M, Johns, Timothy P

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