Critical dimension of biperiodic gratings determined by spectral ellipsometry and Mueller matrix polarimetry von Foldyna, M., De Martino, A., Garcia-Caurel, E., Ossikovski, R., Licitra, C., Bertin, F., Postava, K., Drevillon, B.

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Angle-resolved Mueller polarimeter using a microscope objective von Ben Hatit, S., Foldyna, M., De Martino, A., Drévillon, B.

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Spectroscopic Mueller polarimeter based on liquid crystal devices von Garcia-Caurel, E., De Martino, A., Drévillon, B.

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General and self-consistent method for the calibration of polarization modulators, polarimeters, and mueller-matrix ellipsometers von Compain, E, Poirier, S, Drevillon, B

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Optical characterisation of anatase: a comparative study of the bulk crystal and the polycrystalline thin film von Viseu, T.M.R., Almeida, B., Stchakovsky, M., Drevillon, B., Ferreira, M.I.C., Sousa, J.B.

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Optimized Mueller polarimeter with liquid crystals von De Martino, Antonello, Kim, Yong-Ki, Garcia-Caurel, Enric, Laude, Blandine, Drévillon, Bernard

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Recombination traffic in highly crystallized undoped microcrystalline Si films studied by steady state photoconductivity von Ram, Sanjay K., Kumar, Satyendra, Vanderhaghen, R., Drevillon, B., Rocca i Cabarrocas, P.

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Monitoring critical dimensions of bidimensional gratings by spectroscopic ellipsometry and Mueller polarimetry von Foldyna, M., De Martino, A., Garcia-Caurel, E., Ossikovski, R., Bertin, F., Hazart, J., Postava, K., Drevillon, B.

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Mueller polarimetric imaging system with liquid crystals von Laude-Boulesteix, Blandine, De Martino, Antonello, Drévillon, Bernard, Schwartz, Laurent

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In situ studies of the growth of hydrogenated amorphous silicon von Drevillon, B.

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General methods for optimized design and calibration of Mueller polarimeters von De Martino, A., Garcia-Caurel, E., Laude, B., Drévillon, B.

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Ellipsometric method for real time control of thin film deposition on imperfect substrates von Hofrichter, A., Heitz, T., Bulkin, P., Drevillon, B.

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Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system von Botha, R., Haj Ibrahim, B., Bulkin, P., Drévillon, B.

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Electronic state modification in laser deposited amorphous carbon films by the inclusion of nitrogen von Miyajima, Y., Adamopoulos, G., Henley, S. J., Stolojan, V., Tison, Y., Garcia-Caurel, E., Drévillon, B., Shannon, J. M., Silva, S. R. P.

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Spectroscopic ellipsometry of ultrathin films: From UV to IR von Drevillon, B.

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Mueller matrix of dense polystyrene latex sphere suspensions: measurements and Monte Carlo simulation von Kaplan, B, Ledanois, G, Drévillon, B

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A real time ellipsometry study of the growth of amorphous silicon on transparent conducting oxides von SATYENDRA KUMAR, DREVILLON, B

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Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique von Roca i Cabarrocas, P., Brenot, R., Bulkin, P., Vanderhaghen, R., Drévillon, B., French, I.

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Surface modifications of polycarbonate (PC) and polyethylene terephtalate (PET) by cold remote nitrogen plasma (CRNP) von Jama, C., Dessaux, O., Goudmand, P., Mutel, B., Gengembre, L., Drevillon, B., Vallon, S., Grimblot, J.

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In situ studies of semiconductor processes by spectroellipsometry von DREVILLON, B

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