Treffer 1 - 13 von 13 für Suche 'Downes, Keith Edward', Suchdauer: 0,60s Treffer weiter einschränken
  1. 1
    Method of integration of a MIM capacitor with a lower plate of metal gate material formed on an STI region or a silicide region formed in or on the surface of a doped well with a high K dielectric material

    Method of integration of a MIM capacitor with a lower plate of metal gate material formed on an STI region or a silicide region formed in or on the surface of a doped well with a h... von Chinthakindi, Anil Kumar, Coolbaugh, Douglas Duane, Downes, Keith Edward, Eshun, Ebenezer E, He, Zhong-Xiang, Rassel, Robert Mark, Stamper, Anthony Kendall, Vaed, Kunal

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  2. 2
    Method of integration of a MIM capacitor with a lower plate of metal gate material formed on an STI region or a silicide region formed in or on the surface of a doped well with a high K dielectric material

    Method of integration of a MIM capacitor with a lower plate of metal gate material formed on an STI region or a silicide region formed in or on the surface of a doped well with a h... von RASSEL ROBERT MARK, STAMPER ANTHONY KENDALL, DOWNES KEITH EDWARD, COOLBAUGH DOUGLAS DUANE, VAED KUNAL, CHINTHAKINDI ANIL KUMAR, HE ZHONG-XIANG, ESHUN EBENEZER E

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  3. 3
    Method of Integration of a MIM Capacitor with a Lower Plate of Metal Gate Material Formed on an STI Region or a Silicide Region Formed in or on the Surface of a Doped Well with a High K Dielectric Material

    Method of Integration of a MIM Capacitor with a Lower Plate of Metal Gate Material Formed on an STI Region or a Silicide Region Formed in or on the Surface of a Doped Well with a H... von RASSEL ROBERT MARK, STAMPER ANTHONY KENDALL, DOWNES KEITH EDWARD, COOLBAUGH DOUGLAS DUANE, VAED KUNAL, CHINTHAKINDI ANIL KUMAR, HE ZHONG-XIANG, ESHUN EBENEZER E

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  4. 4
    Integration of a MIM capacitor with a plate formed in a well region and with a high-k dielectric

    Integration of a MIM capacitor with a plate formed in a well region and with a high-k dielectric von Chinthakindi, Anil Kumar, Coolbaugh, Douglas Duane, Downes, Keith Edward, Eshun, Ebenezer E, He, Zhong-Xiang, Rassel, Robert Mark, Stamper, Anthony Kendall, Vaed, Kunal

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  5. 5
    Integration of a MIM capacitor with a plate formed in a well region and with a high-k dielectric

    Integration of a MIM capacitor with a plate formed in a well region and with a high-k dielectric von RASSEL ROBERT MARK, STAMPER ANTHONY KENDALL, DOWNES KEITH EDWARD, COOLBAUGH DOUGLAS DUANE, VAED KUNAL, CHINTHAKINDI ANIL KUMAR, HE ZHONG-XIANG, ESHUN EBENEZER E

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  6. 6
    INTEGRATION OF A MIM CAPACITOR OVER A METAL GATE OR SILICIDE WITH HIGH-K DIELECTRIC MATERIALS

    INTEGRATION OF A MIM CAPACITOR OVER A METAL GATE OR SILICIDE WITH HIGH-K DIELECTRIC MATERIALS von COOLBAUGH, DOUGLAS, DUANE, RASSEL, ROBERT, MARK, CHINTHAKINDI, ANIL, KUMAR, HE, ZHONG-XIANG, VAED, KUNAL, STAMPER, ANTHONY, KENDALL, DOWNES, KEITH, EDWARD, ESHUN, EBENEZER

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  7. 7
    Metal seed layer deposition

    Metal seed layer deposition von DOWNES KEITH E, COONEY, III EDWARD C, MCDEVITT THOMAS L, MURPHY WILLIAM J, BARKYOUMB STEVEN P, CHAPPLE-SOKOL JONATHAN D

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  8. 8
    Metal seed layer deposition

    Metal seed layer deposition von Barkyoumb, Steven P, Chapple-Sokol, Jonathan D, Cooney, III, Edward C, Downes, Keith E, McDevitt, Thomas L, Murphy, William J

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  9. 9
    Process-induced voiding in copper interconnect metallization

    Process-induced voiding in copper interconnect metallization von LINDGREN, Peter, DOWNES, Keith, COLE, Stephen, MURPHY, William, COONEY, Edward III, GOLDSTEIN, Mark, CHAPPLE-SOKOL, Jonathan


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  10. 10
    METAL SEED LAYER DEPOSITION

    METAL SEED LAYER DEPOSITION von DOWNES KEITH E, COONEY EDWARD C.III, MCDEVITT THOMAS L, MURPHY WILLIAM J, BARKYOUMB STEVEN P, CHAPPLE-SOKOL JONATHAN D

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  11. 11
    Metal seed layer deposition

    Metal seed layer deposition von DOWNES KEITH E, COONEY, III EDWARD C, MCDEVITT THOMAS L, MURPHY WILLIAM J, BARKYOUMB STEVEN P, CHAPPLE-SOKOL JONATHAN D

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  12. 12
    Metal seed layer deposition

    Metal seed layer deposition von Barkyoumb, Steven P, Chapple-Sokol, Jonathan D, Cooney, III, Edward C, Downes, Keith E, McDevitt, Thomas L, Murphy, William J

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  13. 13
    METAL SEED LAYER DEPOSITION

    METAL SEED LAYER DEPOSITION von DOWNES KEITH E, COONEY EDWARD C.III, MCDEVITT THOMAS L, MURPHY WILLIAM J, BARKYOUMB STEVEN P, CHAPPLE-SOKOL JONATHAN D

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