Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes von Attota, Ravikiran, Dixson, Ronald G.

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Comparison of line width calibration using critical dimension atomic force microscopes between PTB and NIST von Dai, Gaoliang, Hahm, Kai, Bosse, Harald, Dixson, Ronald G

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Sub-picoliter Traceability of Microdroplet Gravimetry and Microscopy von Elliott, Lindsay C. C, Pintar, Adam L, Copeland, Craig R, Renegar, Thomas B, Dixson, Ronald G, Ilic, B. Robert, Verkouteren, R. Michael, Stavis, Samuel M

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Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization von Qin, Jing, Silver, Richard M, Barnes, Bryan M, Zhou, Hui, Dixson, Ronald G, Henn, Mark-Alexander

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Tip characterization method using multi-feature characterizer for CD-AFM von Orji, Ndubuisi G., Itoh, Hiroshi, Wang, Chumei, Dixson, Ronald G., Walecki, Peter S., Schmidt, Sebastian W., Irmer, Bernd

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Traceable localization enables accurate integration of quantum emitters and photonic structures with high yield von Copeland, Craig R, Pintar, Adam L, Dixson, Ronald G, Chanana, Ashish, Srinivasan, Kartik, Westly, Daron A, Robert Ilic, B, Davanco, Marcelo I, Stavis, Samuel M

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Generalized ellipsometry of artificially designed line width roughness von Foldyna, Martin, Germer, Thomas A., Bergner, Brent C., Dixson, Ronald G.

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Line edge roughness metrology using atomic force microscopes von Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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Traceable pico-meter level step height metrology von Orji, Ndubuisi G., Dixson, Ronald G., Fu, Joseph, Vorburger, Theodore V.

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RM 8111: Development of a Prototype Linewidth Standard von Cresswell, Michael W, Guthrie, William F, Dixson, Ronald G, Allen, Richard A, Murabito, Christine E, Martinez De Pinillos, J V

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Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks von Smith, S., Tsiamis, A., McCallum, M., Hourd, A.C., Stevenson, J.T.M., Walton, A.J., Dixson, R.G., Allen, R.A., Potzick, J.E., Cresswell, M.W., Orji, N.G.

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Recent developments in electrical linewidth and overlay metrology for integrated circuit fabrication processes von CRESSWELL, M. W, SNIEGOWSKI, J. J, GHOSHTAGORE, R. N, ALLEN, R. A, GUTHRIE, W. F, GURNELL, A. W, LINHOLM, L. W, DIXSON, R. G, TEAGUE, E. C

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Computational Models of a Nano Probe Tip for Static Behaviors von Feng, Shaw C., Vorburger, Theodore V., Joung, Che bong, Dixson, Ronald G., Fu, Joseph, Ma, Li

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Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications von Patrick, Heather J, Germer, Thomas A, Cresswell, Michael W, Allen, Richard A, Dixson, Ronald G, Bishop, Michael

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CD Reference Materials Fabricated on Monolithic 200 mm Wafers for Automated Metrology Tool Applications von Allen, Richard A, Dixson, Ronald G, Cresswell, Michael W, Guthrie, William F, Shulver, Byron J R, Bunting, A S, Stevenson, J T M, Walton, Anthony J

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Line edge roughness metrology using atomic force microscopes von Orji, Ndubuisi G, Vorburger, Theodore V, Fu, Joseph, Dixson, Ronald G, Nguyen, Cattien V, Raja, Jayaraman

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Comparison of SEM and HRTEM CD Measurements Extracted From Test Structures Having Feature Linewidths From 40 to 240 nm von Cresswell, M.W., Allen, R.A., Guthrie, W.F., Murabito, C.E., Dixson, R.G., Hunt, A.

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Sub-picoliter Traceability of Microdroplet Gravimetry and Microscopy von Elliott, Lindsay C. C, Pintar, Adam L, Copeland, Craig R, Renegar, Thomas B, Dixson, Ronald G, Ilic, B. Robert, Verkouteren, R. Michael, Stavis, Samuel M

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Traceable localization enables accurate integration of quantum emitters and photonic structures with high yield von Copeland, Craig R, Pintar, Adam L, Dixson, Ronald G, Chanana, Ashish, Srinivasan, Kartik, Westly, Daron A, Ilic, B. Robert, Davanco, Marcelo I, Stavis, Samuel M

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A Systematic Approach to Accurate Evaluation of CD-Metrology Tools von Orji, N.G., Bunday, B.D., Dixson, R.G., Allgair, J.A.

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