Enhanced Optical Second-Harmonic Generation from the Current-Biased Graphene/SiO2/Si(001) Structure von An, Yong Q, Nelson, Florence, Lee, Ji Ung, Diebold, Alain C

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Role of Ge and Si substrates in higher-k tetragonal phase formation and interfacial properties in cyclical atomic layer deposition-anneal Hf1−xZrxO2/Al2O3 thin film stacks von Dey, Sonal, Tapily, Kandabara, Consiglio, Steven, Clark, Robert D., Wajda, Cory S., Leusink, Gert J., Woll, Arthur R., Diebold, Alain C.

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Optical properties of large-area polycrystalline chemical vapor deposited graphene by spectroscopic ellipsometry von Nelson, F. J., Kamineni, V. K., Zhang, T., Comfort, E. S., Lee, J. U., Diebold, A. C.

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Perspective: Optical measurement of feature dimensions and shapes by scatterometry von Diebold, Alain C., Antonelli, Andy, Keller, Nick

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3D-interconnect: Visualization of extrusion and voids induced in copper-filled through-silicon vias (TSVs) at various temperatures using X-ray microscopy von Kong, LayWai, Rudack, Andrew C., Krueger, Peter, Zschech, Ehrenfried, Arkalgud, Sitaram, Diebold, A.C.

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Complete band offset characterization of the HfO2/SiO2/Si stack using charge corrected x-ray photoelectron spectroscopy von Bersch, E., Di, M., Consiglio, S., Clark, R. D., Leusink, G. J., Diebold, A. C.

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Optical second-harmonic generation induced by electric current in graphene on Si and SiC substrates von An, Yong Q., Rowe, J. E., Dougherty, Daniel B., Lee, Ji Ung, Diebold, Alain C.

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Optical second harmonic generation from silicon (100) crystals with process tailored surface and embedded silver nanostructures for silicon nonlinear nanophotonics von Bhowmik, Gourav, An, Yong Q., Schujman, Sandra, Diebold, Alain C., Huang, Mengbing

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Electron-phonon interaction effects on the direct gap transitions of nanoscale Si films von Kamineni, V. K., Diebold, A. C.

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Dielectric properties and thickness metrology of strain engineered GaN/AlN/Si (111) thin films grown by MOCVD von Tungare, M., Kamineni, V.K., Shahedipour-Sandvik, F., Diebold, A.C.

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Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications von Dey, Sonal, Yu, Kai-Hung, Consiglio, Steven, Tapily, Kandabara, Hakamata, Takahiro, Wajda, Cory S., Leusink, Gert J., Jordan-Sweet, Jean, Lavoie, Christian, Muir, David, Moreno, Beatriz, Diebold, Alain C.

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Electronic Excitations in Graphene in the 1–50 eV Range: The π and π + σ Peaks Are Not Plasmons von Nelson, Florence J, Idrobo, Juan-Carlos, Fite, John D, Mišković, Zoran L, Pennycook, Stephen J, Pantelides, Sokrates T, Lee, Ji Ung, Diebold, Alain C

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Subsurface Imaging with Scanning Ultrasound Holography von Diebold, Alain C.

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Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon von Kamineni, Himani S., Kamineni, Vimal K., Moore, Richard L., Gallis, Spyros, Diebold, Alain C., Huang, Mengbing, Kaloyeros, Alain E.

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Observation of quantum confinement and quantum size effects von Diebold, A. C., Price, J.

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Investigation of optical properties of benzocyclobutene wafer bonding layer used for 3D interconnects via infrared spectroscopic ellipsometry von Kamineni, Vimal K., Singh, Pratibha, Kong, LayWai, Hudnall, John, Qureshi, Jamal, Taylor, Chris, Rudack, Andy, Arkalgud, Sitaram, Diebold, Alain C.

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Enhancing one dimensional sensitivity with plasmonic coupling: erratum von O'Mullane, Samuel, Peterson, Brennan, Race, Joseph, Keller, Nick, Diebold, Alain C

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Enhancing one dimensional sensitivity with plasmonic coupling von O'Mullane, Samuel, Peterson, Brennan, Race, Joseph, Keller, Nick, Diebold, Alain C

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Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2 films von Mukundan, Vineetha, Consiglio, Steven, Triyoso, Dina H., Tapily, Kandabara, Schujman, Sandra, Mart, Clemens, Kämpfe, Thomas, Weinreich, Wenke, Jordan-Sweet, Jean, Clark, Robert D., Leusink, Gert J., Diebold, Alain C.

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Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cycl... von Vasić, Relja, Consiglio, Steven, Clark, Robert D., Tapily, Kandabara, Sallis, Shawn, Chen, Bo, Newby, David, Medikonda, Manasa, Raja Muthinti, Gangadhara, Bersch, Eric, Jordan-Sweet, Jean, Lavoie, Christian, Leusink, Gert J., Diebold, Alain C.

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