Magnetic and electrical characterization of nickel-rich NiFe thin films synthesized by atomic layer deposition and subsequent thermal reduction von Espejo, A P, Zierold, R, Gooth, J, Dendooven, J, Detavernier, C, Escrig, J, Nielsch, K

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Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability von Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

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Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate von Musschoot, J., Dendooven, J., Deduytsche, D., Haemers, J., Buyle, G., Detavernier, C.

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Air-based photoelectrochemical cell capturing water molecules from ambient air for hydrogen production von Rongé, J., Deng, S., Pulinthanathu Sree, S., Bosserez, T., Verbruggen, S. W., Kumar Singh, N., Dendooven, J., Roeffaers, M. B. J., Taulelle, F., De Volder, M., Detavernier, C., Martens, J. A.

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Catalytic activation of OKO zeolite with intersecting pores of 10- and 12-membered rings using atomic layer deposition of aluminium von Verheyen, E, Pulinthanathu Sree, S, Thomas, K, Dendooven, J, De Prins, M, Vanbutsele, G, Breynaert, E, Gilson, J-P, Kirschhock, C E A, Detavernier, C, Martens, J A

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TiO2-coated luminescent porous silicon micro-particles as a promising system for nanomedicine von Chistè, E, Ghafarinazari, A, Donini, M, Cremers, V, Dendooven, J, Detavernier, C, Benati, D, Scarpa, M, Dusi, S, Daldosso, N

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A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after Atomic Layer Deposition of alumina von Vandegehuchte, B.D., Thybaut, J.W., Detavernier, C., Deduytsche, D., Dendooven, J., Martens, J.A., Sree, S.P., Korányi, T.I., Marin, G.B.

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In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO2 on Si and Ge substrates von Devloo-Casier, K., Dendooven, J., Ludwig, K. F., Lekens, G., D’Haen, J., Detavernier, C.

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Plasma-Enhanced Atomic Layer Deposition of Iron and Titanium Phosphates as Electrode Materials for 3D-Structured Lithium-Ion Microbatteries von Dobbelaere, Thomas, Mattelaer, Felix, Dendooven, Jolien, Vereecken, Philippe M., Detavernier, Christophe

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Tailoring nanoporous materials by atomic layer deposition von Detavernier, Christophe, Dendooven, Jolien, Sree, Sreeprasanth Pulinthanathu, Ludwig, Karl F, Martens, Johan A

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TiO 2 -coated luminescent porous silicon micro-particles as a promising system for nanomedicine von Chistè, E, Ghafarinazari, A, Donini, M, Cremers, V, Dendooven, J, Detavernier, C, Benati, D, Scarpa, M, Dusi, S, Daldosso, N

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Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition von Dendooven, J., Deduytsche, D., Musschoot, J., Vanmeirhaeghe, R. L., Detavernier, C.

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In Situ Study of ALD Processes Using Synchrotron-based X-ray Fluorescence and Scattering Techniques von Dendooven, Jolien, Devloo-Casier, Kilian, Ide, Matthias, Grandfield, Kathryn, Ludwig, Karl F., Bals, Sara, Van Der Voort, Pascal, Detavernier, Christophe

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In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films von Dendooven, Jolien, Pulinthanathu Sree, Sreeprasanth, De Keyser, Koen, Deduytsche, Davy, Martens, Johan A, Ludwig, Karl F, Detavernier, Christophe

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In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition von Devloo-Casier, Kilian, Ludwig, Karl F., Detavernier, Christophe, Dendooven, Jolien

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Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering von Dendooven, Jolien, Devloo-Casier, Kilian, Ide, Matthias, Grandfield, Kathryn, Kurttepeli, Mert, Ludwig, Karl F, Bals, Sara, Van Der Voort, Pascal, Detavernier, Christophe

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Tuning the Pore Size of Ink-Bottle Mesopores by Atomic Layer Deposition von Dendooven, Jolien, Goris, Bart, Devloo-Casier, Kilian, Levrau, Elisabeth, Biermans, Ellen, Baklanov, Mikhail R, Ludwig, Karl F, Voort, Pascal Van Der, Bals, Sara, Detavernier, Christophe

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Atomic Layer Deposition of TiO2 on Surface Modified Nanoporous Low‑k Films von Levrau, Elisabeth, Devloo-Casier, Kilian, Dendooven, Jolien, Ludwig, Karl F, Verdonck, Patrick, Meersschaut, Johan, Baklanov, Mikhail. R, Detavernier, Christophe

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Ferroelectricity of HfxZr1−xO2 Thin Films Fabricated Using TiN Stressor and ZrO2 Nucleation Techniques von Onaya, Takashi, Nabatame, Toshihide, Sawamoto, Naomi, Kurishima, Kazunori, Ohi, Akihiko, Ikeda, Naoki, Nagata, Takahiro, Ogura, Atsushi

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(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry von Mameli, Alfredo, Karasulu, Bora, Verheijen, Marcel A., Mackus, Adriaan J.M., Kessels, W. M. M., Roozeboom, Fred

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