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  1. 1
    Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists

    Stochastic Modeling and Local CD Uniformity Comparison between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists von KAMOHARA, Itaru, WELLING, Ulrich, KLOSTERMANN, Ulrich, DEMMERLE, Wolfgang


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  2. 2
    Stochastic modeling and local CD uniformity comparison between negative metal-based, negative- and positive- tone development EUV resists

    Stochastic modeling and local CD uniformity comparison between negative metal-based, negative- and positive- tone development EUV resists von Kamohara, Itaru, Welling, Ulrich, Klostermann, Ulrich, Demmerle, Wolfgang


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  3. 3
    Applying stochastic simulation to study defect formation in EUV photoresists

    Applying stochastic simulation to study defect formation in EUV photoresists von Melvin, Lawrence S., Welling, Ulrich, Kandel, Yudhishthir, Levinson, Zachary A., Taoka, Hironobu, Stock, Hans-Jurgen, Demmerle, Wolfgang


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  4. 4
    Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

    Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects von Upadhyaya, Mihir, Basavalingappa, Adarsh, Herbol, Henry, Denbeaux, Gregory, Jindal, Vibhu, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, Pistor, Thomas V.


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  5. 5
    Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects

    Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects von Upadhyaya, Mihir, Basavalingappa, Adarsh, Herbol, Henry, Denbeaux, Gregory, Jindal, Vibhu, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, Pistor, Thomas V.


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