On the dynamics in chemical vapor deposition of InN von Hsu, Chih-Wei, Deminskyi, Petro, Persson, Anton, Karlsson, Matts, Pedersen, Henrik

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Direct epitaxial nanometer-thin InN of high structural quality on 4H–SiC by atomic layer deposition von Hsu, Chih-Wei, Deminskyi, Petro, Martinovic, Ivan, Ivanov, Ivan G., Palisaitis, Justinas, Pedersen, Henrik

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Area-Selective Atomic Layer Deposition Using an Inductively Coupled Plasma Polymerized Fluorocarbon Layer: A Case Study for Metal Oxides von Haider, Ali, Deminskyi, Petro, Khan, Talha M, Eren, Hamit, Biyikli, Necmi

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Atomic Layer Deposition of AlN on Graphene von Beshkova, Milena, Deminskyi, Petro, Hsu, Chih‐Wei, Shtepliuk, Ivan, Avramova, Ivalina, Yakimova, Rositsa, Pedersen, Henrik

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Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition von Haider, Ali, Deminskyi, Petro, Yilmaz, Mehmet, Elmabruk, Kholoud, Yilmaz, Ibrahim, Biyikli, Necmi

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Atomic Layer Deposition of Molybdenum Carbide Thin Films von Kärkkäinen, Paloma Ruiz, Popov, Georgi, Hatanpää, Timo, Kemppinen, Antti, Kohopää, Katja, Bagheri, Mohammad, Komsa, Hannu‐Pekka, Heikkilä, Mikko, Mizohata, Kenichiro, Chundak, Mykhailo, Deminskyi, Petro, Vihervaara, Anton, Ribeiro, Mário, Hätinen, Joel, Govenius, Joonas, Putkonen, Matti, Ritala, Mikko

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NLL-Assisted Multilayer Graphene Patterning von Kovalska, Evgeniya, Pavlov, Ihor, Deminskyi, Petro, Baldycheva, Anna, Ilday, F. Ömer, Kocabas, Coskun

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Atomic layer deposition of InN using trimethylindium and ammonia plasma von Deminskyi, Petro, Rouf, Polla, Ivanov, Ivan G., Pedersen, Henrik

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Nanoscale selective area atomic layer deposition of TiO2 using e-beam patterned polymers von Haider, Ali, Yilmaz, Mehmet, Deminskyi, Petro, Eren, Hamit, Biyikli, Necmi

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Surface ligand removal in atomic layer deposition of GaN using triethylgallium von Deminskyi, Petro, Hsu, Chih-Wei, Bakhit, Babak, Rouf, Polla, Pedersen, Henrik

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Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors von Deminskyi, Petro, Haider, Ali, Eren, Hamit, Khan, Talha M., Biyikli, Necmi

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Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides von Deminskyi, Petro, Haider, Ali, Kovalska, Evgeniya, Biyikli, Necmi

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Atomic layer deposition of AlN using trimethylaluminium and ammonia von Beshkova, M, Deminskyi, P, Pedersen, H, Yakimova, R

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Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design von Buttera, Sydney C, Rouf, Polla, Deminskyi, Petro, O’Brien, Nathan J, Pedersen, Henrik, Barry, Seán T

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Nanoscale selective area atomic layer deposition of TiO 2 using e-beam patterned polymers von Haider, Ali, Yilmaz, Mehmet, Deminskyi, Petro, Eren, Hamit, Biyikli, Necmi

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Nanoscale selective area atomic layer deposition of TiO2 using e-beam patterned polymersElectronic supplementary information (ESI) available. See DOI: 10.1039/c6ra23923d von Haider, Ali, Yilmaz, Mehmet, Deminskyi, Petro, Eren, Hamit, Biyikli, Necmi

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Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer depositionElectronic supplementary information (ESI) available. See DOI: 10.1039/c8tc0... von Haider, Ali, Deminskyi, Petro, Yilmaz, Mehmet, Elmabruk, Kholoud, Yilmaz, Ibrahim, Biyikli, Necmi

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METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING A GROUP 13 ELEMENT ON A SUBSTRATE von XIE, Qi, DEMINSKYI, Petro, DEZELAH, Charles

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METHOD OF DEPOSITING VANADIUM METAL, STRUCTURE, DEVICE AND A DEPOSITION ASSEMBLY von Deminskyi, Petro, Dezelah, Charles, Shero, Eric James, Xie, Qi, Alessio Verni, Giuseppe

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Method of depositing vanadium metal von Deminskyi, Petro, Dezelah, Charles, Shero, Eric James, Xie, Qi, Alessio Verni, Giuseppe

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