Towards a more complete model for reactive magnetron sputtering von Depla, D, Heirwegh, S, Mahieu, S, De Gryse, R

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Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation von Depla, D., De Gryse, R.

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Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering von Depla, D., De Gryse, R.

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Photocatalytic activity of dc magnetron sputter deposited amorphous TiO2 thin films von EUFINGER, K, POELMAN, D, POELMAN, H, DE GRYSE, R, MARIN, G. B

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The role of the erosion groove during reactive sputter deposition von Depla, D., Strijckmans, K., De Gryse, R.

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Understanding the discharge voltage behavior during reactive sputtering of oxides von Depla, D., Heirwegh, S., Mahieu, S., Haemers, J., De Gryse, R.

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Magnetron sputter deposition: Linking discharge voltage with target properties von Depla, D., Mahieu, S., De Gryse, R.

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Target poisoning during reactive magnetron sputtering: Part III: the prediction of the critical reactive gas mole fraction von Depla, D., De Gryse, R.

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Biaxial alignment in sputter deposited thin films von Mahieu, S., Ghekiere, P., Depla, D., De Gryse, R.

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Scanning electron microscopy study of the growth mechanism of biaxially aligned magnesium oxide layers grown by unbalanced magnetron sputtering von Ghekiere, P., Mahieu, S., De Winter, G., De Gryse, R., Depla, D.

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Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation von Musschoot, J, Depla, D, Buyle, G, Haemers, J, De Gryse, R

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Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN von Mahieu, S., Depla, D., Gryse, R. De

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Influence of oxygen addition on the target voltage during reactive sputtering of aluminium von Depla, D, Gryse, R De

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Discharge voltage measurements during magnetron sputtering von Depla, D., Buyle, G., Haemers, J., De Gryse, R.

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The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering von EUFINGER, K, JANSSEN, E. N, POELMAN, H, POELMAN, D, DE GRYSE, R, MARIN, G. B

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Determination of the effective electron emission yields of compound materials von Depla, D, Li, X Y, Mahieu, S, De Gryse, R

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Modelling the growth of transition metal nitrides von Mahieu, S, Depla, D, Gryse, R De

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Calculation of the effective gas interaction probabilities of the secondary electrons in a dc magnetron discharge von Buyle, G, Depla, D, Eufinger, K, Gryse, R De

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Effect of microstructure and crystallinity on the photocatalytic activity of TiO2 thin films deposited by dc magnetron sputtering von Eufinger, K, Poelman, D, Poelman, H, De Gryse, R, Marin, G B

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Influencing the hysteresis during reactive magnetron sputtering by gas separation von Depla, D., Haemers, J., De Gryse, R.

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