Successful Growth of Conductive Highly Crystalline Sn-Doped $\alpha$-Ga2O3 Thin Films by Fine-Channel Mist Chemical Vapor Deposition von Kawaharamura, Toshiyuki, Dang, Giang T, Furuta, Mamoru

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Growth of α-Ga2O3 from Gallium Acetylacetonate under HCl Support by Mist Chemical Vapor Deposition von Yasuoka, Tatsuya, Liu, Li, Dang, Giang T., Kawaharamura, Toshiyuki

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Stability of In-Ga-Zn-O metal-semiconductor field-effect-transistors under bias, illumination, and temperature stress von Dang, Giang T., Kawaharamura, Toshiyuki, Furuta, Mamoru, Saxena, Saurabh, Allen, Martin W.

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The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition von Yasuoka, Tatsuya, Liu, Li, Ozaki, Tamako, Asako, Kanta, Ishikawa, Yuna, Fukue, Miyabi, Dang, Giang T., Kawaharamura, Toshiyuki

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Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition von Rutthongjan, Phimolphan, Liu, Li, Nishi, Misaki, Sakamoto, Masahito, Sato, Shota, Pradeep, Ellawala K C, Dang, Giang T, Kawaharamura, Toshiyuki

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Challenges of fabrication of a large-area-uniform molybdenum disulfide layered thin film at low growth temperature by atmospheric-pressure solution-based mist CVD von Sato, Shota, Nitta, Noriko, Sakamoto, Masahito, Liu, Li, Rutthongjan, Phimolphan, Nishi, Misaki, Ueda, Mariko, Yasuoka, Tatsuya, Hasegawa, Ryo, Tagashira, Yuki, Ozaki, Tamako, Pradeep, Ellawala K. C., Dang, Giang T., Kawaharamura, Toshiyuki

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Analysis of dislocation defects in compositionally step-graded α-(Al x Ga 1- x ) 2 O 3 layers von Yasuoka, Tatsuya, Susami, Hiromu, Liu, Li, Dang, Giang T, Kawaharamura, Toshiyuki

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Analysis of dislocation defects in compositionally step-graded α-(AlxGa1−x)2O3 layers von Yasuoka, Tatsuya, Susami, Hiromu, Liu, Li, Dang, Giang T, Kawaharamura, Toshiyuki

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The effects of oxygen flow ratio on the properties of Ag x O thin films grown by radio frequency magnetron sputtering von Liu, Xiaojiao, Yasuoka, Tatsuya, Dang, Giang T, Liu, Li, Kawaharamura, Toshiyuki

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The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the Third‐Generation Mist Chemical Vapor Deposition Using Oxygen‐Supporting Sources von Liu, Li, Kawaharamura, Toshiyuki, Sakamoto, Masahito, Nishi, Misaki, Dang, Giang T., Sato, Shota

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Incorporation of yttrium to yttrium iron garnet thin films fabricated by mist CVD von Liu, Li, Suwa, Yuta, Sato, Shota, Nakasone, Yoshiaki, Nishi, Misaki, Dang, Giang T., Pradeep, Ellawala K. C., Kawaharamura, Toshiyuki

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Electronic devices fabricated on mist-CVD-grown oxide semiconductors and their applications von Dang, Giang T., Allen, Martin W., Furuta, Mamoru, Kawaharamura, Toshiyuki

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Atmospheric-pressure epitaxial growth technique of a multiple quantum well by mist chemical vapor deposition based on Leidenfrost droplets von Dang, Giang T.

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The effects of oxygen flow ratio on the properties of AgxO thin films grown by radio frequency magnetron sputtering von Liu, Xiaojiao, Yasuoka, Tatsuya, Dang, Giang T, Liu, Li, Kawaharamura, Toshiyuki

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Growth mechanism under the supply-limited regime in mist chemical vapor deposition: presumption of mist droplet state in high-temperature field von Kawaharamura, Toshiyuki, Nishi, Misaki, Liu, Li, Rutthongjan, Phimolphan, Ishikawa, Yuna, Sakamoto, Masahito, Yasuoka, Tatsuya, Asako, Kanta, Ozaki, Tamako, Fukue, Miyabi, Ueda, Mariko, Sato, Shota, Dang, Giang T.

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α-(AlxGa1−x)2O3 single-layer and heterostructure buffers for the growth of conductive Sn-doped α-Ga2O3 thin films via mist chemical vapor deposition von Dang, Giang T., Sato, Shota, Tagashira, Yuki, Yasuoka, Tatsuya, Liu, Li, Kawaharamura, Toshiyuki

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Conductive Si-doped α-(AlxGa1−x)2O3 thin films with the bandgaps up to 6.22 eV von Dang, Giang T., Tagashira, Yuki, Yasuoka, Tatsuya, Liu, Li, Kawaharamura, Toshiyuki

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Optical Characterization of Gallium Oxide α and β Polymorph Thin-Films Grown on c-Plane Sapphire von Ghadbeigi, Leila, Cooke, Jacqueline, Dang, Giang T., Kawaharamura, Toshiyuki, Yasuoka, Tatsuya, Sun, Rujun, Ranga, Praneeth, Krishnamoorthy, Sriram, Scarpulla, Michael A., Sensale-Rodriguez, Berardi

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Critical Factors Affecting the Efficient Use of Public Investments in Infrastructure in Vietnam von Giang, Dang T. H, Pheng, Low Sui

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Growth mechanism of zinc oxide thin film by mist chemical vapor deposition via the modulation of [H2O]/[Zn] ratios von Rutthongjan, Phimolphan, Nishi, Misaki, Liu, Li, Sato, Shota, Okada, Yuya, Dang, Giang T., Kawaharamura, Toshiyuki

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