Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV von Delachat, Florian, Constancias, Christophe, Reche, Jérôme, Dal'Zotto, Bernard, Pain, Laurent, Le Drogoff, Boris, Chaker, Mohamed, Margot, Joëlle

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Disturbance Effects in Extreme Ultraviolet Interferometric Lithography Affecting Interference Fringes von Saib, Mohamed, Constancias, Christophe, Michallon, Philippe, Dalzotto, Bernard, Besacier, Maxime

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Measuring acid generation efficiency in chemically amplified resists with all three beams von Szmanda, Charles R., Brainard, Robert L., Mackevich, Joseph F., Awaji, Akira, Tanaka, Tsutomu, Yamada, Yutaka, Bohland, John, Tedesco, Serge, Dal’Zotto, Bernard, Bruenger, Wilhelm, Torkler, Michael, Fallmann, Wolfgang, Loeschner, Hans, Kaesmaier, Rainer, Nealey, Paul M., Pawloski, Adam R.

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Method for making a planar membrane von FOURNEL FRANK, MICHALLON PHILIPPE, POUTEAU VALERIE, DALZOTTO BERNARD, MORICEAU HUBERT, CONSTANCIAS CHRISTOPHE

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METHOD FOR MAKING A PLANAR MEMBRANE von FOURNEL FRANK, MICHALLON PHILIPPE, POUTEAU VALERIE, DALZOTTO BERNARD, MORICEAU HUBERT, CONSTANCIAS CHRISTOPHE

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