Impulse plasma deposition of aluminum oxide layers for Al2O3/Si, SiC, GaN systems von Werbowy, A., Zdunek, K., Dusiński, E., Szmidt, J., Elert, M.

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Impulse plasma deposition of aluminum oxide layers for Al2O3/Si, SiC, GaN systems von WERBOWY, A, ZDUNEK, K, DUSINSKI, E, SZMIDT, J, ELERT, M

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Impulse plasma deposition of aluminum oxide layers for Al 2O 3/Si, SiC, GaN systems von Werbowy, A., Zdunek, K., Dusiński, E., Szmidt, J., Elert, M.

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Titanium oxide produced by plasma technology for MOS structures von Dusinski, E., Szmidt, J., Zdunek, K., Elert, M., Barcz, A.

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Al/sub 2/O/sub 3/ layers for microelectronic applications von Dusinski, E., Szmidt, J., Zdunek, K., Elert, M., Barcz, A.

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