Superhydrophobic Polymer Topography Design Assisted by Machine Learning Algorithms von Wang, Qiang, Dumond, Jarrett J, Teo, Jarren, Low, Hong Yee

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Recent developments and design challenges in continuous roller micro- and nanoimprinting von Dumond, Jarrett J., Yee Low, Hong

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Direct Patterning of TiO2 Using Step-and-Flash Imprint Lithography von Ganesan, Ramakrishnan, Dumond, Jarrett, Saifullah, Mohammad S. M, Lim, Su Hui, Hussain, Hazrat, Low, Hong Yee

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High resolution UV roll-to-roll nanoimprinting of resin moulds and subsequent replication via thermal nanoimprint lithography von Dumond, Jarrett J, Mahabadi, Kambiz Ansari, Yee, Yew Sok, Tan, Christina, Fuh, Jerry Ying Hsi, Lee, Heow Pueh, Low, Hong Yee

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Isolated, sealed nanofluidic channels formed by combinatorial-mould nanoimprint lithography von Dumond, Jarrett J, Low, Hong Yee, Rodriguez, Isabel

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Long-Lasting Superhydrophilic Polymers via Multiscale Topographies von Dumond, Jarrett Jonathan, Low, Hong Yee

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Direct Patterning of TiO 2 Using Step-and-Flash Imprint Lithography von Ganesan, Ramakrishnan, Dumond, Jarrett, Saifullah, Mohammad S. M., Lim, Su Hui, Hussain, Hazrat, Low, Hong Yee

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Superhydrophobic surfaces with embedded protective sawtooth ring microstructures von Dumond, Jarrett, Mendez, Alon, Ranganath, Anupama, Di Lena, Fabio, Low, Hong Yee

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Inside Front Cover: Residual Layer Self-Removal in Imprint Lithography (Adv. Mater. 7/2008) von Dumond, Jarrett, Low, Hong Yee

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Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale von Ho, Jian-Wei, Wee, Qixun, Dumond, Jarrett, Tay, Andrew, Chua, Soo-Jin

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Large Area, Facile Oxide Nanofabrication via Step-and-Flash Imprint Lithography of Metal–Organic Hybrid Resins von Dinachali, Saman Safari, Dumond, Jarrett, Saifullah, Mohammad S. M, Ansah-Antwi, Kwadwo Konadu, Ganesan, Ramakrishnan, Thian, Eng San, He, Chaobin

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Combinatorial-mold imprint lithography: A versatile technique for fabrication of three-dimensional polymer structures von Low, Hong Yee, Zhao, Wei, Dumond, Jarrett

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Residual Layer Self-Removal in Imprint Lithography von Dumond, Jarrett, Low, Hong Yee

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Direct Patterning of TiO sub(2) Using Step-and-Flash Imprint Lithography von Ganesan, Ramakrishnan, Dumond, Jarrett, Saifullah, Mohammad SM, Lim, Su Hui, Hussain, Hazrat, Low, Hong Yee

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Combinatorial-mold imprint lithography: A versatile techniquefor fabrication of three-dimensional polymer structures von Low, Hong Yee, Zhao, Wei, Dumond, Jarrett

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Imprinting Apparatus and Method von JARRETT DUMOND

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TEXTURED POLYMER SURFACES WITH SUPERHYDROPHILIC PROPERTIES von LOW, Hong Yee, DUMOND, Jarrett J, MENDEZ, Alon Ramos

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PROCESS FOR FORMING A LAMINATED STRUCTURE von LOW HONG YEE, DUMOND JARRETT

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A HYDROPHOBIC IMPACT TEXTURED SURFACE AND A METHOD OF MAKING THE SAME von Dumond, Jarrett J, Low, Hong Yee, Ramos Mendez, Alon

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HYDROPHOBIC IMPACT TEXTURED SURFACE AND A METHOD OF MAKING THE SAME von Dumond, Jarrett J, Low, Hong Yee, Mendez, Alon Ramos

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