Stoichiometry of Silicon Dioxide Films Obtained by Ion-Beam Sputtering von Telesh, E. V., Dostanko, A. P., Gurevich, O. V.

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Technological microwave plasma module for reactive-ion etching of electronic devices in dual-frequency discharge von Bordusov, S.V., Dostanko, A.P.

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Examination of the heat and electrical modes of the M-112 magnetron operation within the plasma unit von Bordusov, S.V., Dostanko, A.P.

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Designs of applicators of a microwave plasmatrones for technological application von Bordusov, S.V., Dostanko, A.P., Dribina, O.M.

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Investigation of spatial homogeneity of microwave discharge plasma by means of optical emission spectroscopy method von Bordusov, S.V., Dostanko, A.P., Spiridonov, S.V.

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METHOD OF PLASMA ETCHING OF ALUMINIUM von Grushetskij S.V, Dostanko A.P

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DEVICE FOR APPLYING GALVANIC COATINGS von DOSTANKO A.P, KOLESNIK V.D, ANUFRIEV L.P, KUTSENKO V.M, KHOMICH V.I, KHMYL A.A, BERTOSH L.S

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TEMPERATURE MEASURING DEVICE von DOSTANKO A.P.,SU, GAJDUKEVICH YU.CH.,SU, DOMARENOK N.I.,SU, MARCHENKO V.M.,SU

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HIGH-TEMPERATURE MODEL OF ABSOLUTELY BLACK BODY von KARPUT V.A.,SU, SOLOVEJ G.I.,SU, DOSTANKO A.P.,SU, SOTNIKOV-YUZHIK YU.M.,SU, SOBCHUK N.S.,SU, TKHOSTOV M.KH.,SU, DOMARENOK N.I.,SU

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