Treffer 1 - 20 von 220 für Suche 'DORAN JAMES E', Suchdauer: 1,05s Treffer weiter einschränken
  1. 1
    A 47 Million Pixel High-Performance Interline CCD Image Sensor

    A 47 Million Pixel High-Performance Interline CCD Image Sensor von Shen Wang, Carpenter, Douglas A., DeJager, Adam, DiBella, James A., Doran, James E., Fabinski, Robert P., Garland, Andrew, Johnson, James A., Yaniga, Ryan


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  2. 2
    43- and 50-Mp High-Performance Interline CCD Image Sensors

    43- and 50-Mp High-Performance Interline CCD Image Sensors von Wang, Shen, Brolly, Richard, Carpenter, Douglas A., DeJager, Adam, Doran, James E., Fabinski, Robert P., Frank, Tom, Kather, Ryan, Kosman, Stephen, Lum, Alden, McCarten, John, Meisenzahl, Eric J., Mersich, Peter, Stevens, Eric, Summa, Joseph, Tivarus, Cristian, Tobey, Brian


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  3. 3
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von FABINSKI, Robert, Pierre, DORAN, James, E, MEISENZAHL, Eric, John

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  4. 4
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von FABINSKI, Robert, Pierre, DORAN, James, E, SUMMA, Joseph, MEISENZAHL, Eric, John

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  5. 5
    Stitching methods using multiple microlithographic expose tools

    Stitching methods using multiple microlithographic expose tools von MEISENZAHL ERIC J, DORAN JAMES E, FABINSKI ROBERT P

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  6. 6
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von MEISENZAHL, ERIC, JOHN, DORAN, JAMES, E, FABINSKI, ROBERT, PIERRE

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  7. 7
    STITCHING METHODS USING MULTIPLE MICROLITHOGRAPHIC EXPOSE TOOLS

    STITCHING METHODS USING MULTIPLE MICROLITHOGRAPHIC EXPOSE TOOLS von MEISENZAHL ERIC J, DORAN JAMES E, FABINSKI ROBERT P

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  8. 8
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von MEISENZAHL, ERIC, JOHN, DORAN, JAMES, E, FABINSKI, ROBERT, PIERRE

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  9. 9
    Stitching methods using multiple microlithographic expose tools

    Stitching methods using multiple microlithographic expose tools von MEISENZAHL ERIC J, SUMMA JOSEPH R, DORAN JAMES E, FABINSKI ROBERT P

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  10. 10
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von MEISENZAHL, ERIC, JOHN, DORAN, JAMES, E, SUMMA, JOSEPH, FABINSKI, ROBERT, PIERRE

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  11. 11
    Identification of dies on a semiconductor wafer

    Identification of dies on a semiconductor wafer von MEISENZAHL ERIC J, WANG SHEN, PACE LAUREL J, DORAN JAMES E, FABINSKI ROBERT P

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  12. 12
    Identification of dies on a semiconductor wafer

    Identification of dies on a semiconductor wafer von MEISENZAHL ERIC J, WANG SHEN, PACE LAUREL J, DORAN JAMES E, FABINSKI ROBERT P

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  13. 13
    IDENTIFICATION OF DIES ON A SEMICONDUCTOR WAFER

    IDENTIFICATION OF DIES ON A SEMICONDUCTOR WAFER von MEISENZAHL ERIC J, WANG SHEN, PACE LAUREL J, DORAN JAMES E, FABINSKI ROBERT P

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  14. 14
    IDENTIFICATION OF DIES ON A SEMICONDUCTOR WAFER

    IDENTIFICATION OF DIES ON A SEMICONDUCTOR WAFER von MEISENZAHL ERIC J, WANG SHEN, PACE LAUREL J, DORAN JAMES E, FABINSKI ROBERT P

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  15. 15
    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES

    PRODUCTION METHODS USING TWO EXPOSURE TOOLS AND ADJACENT EXPOSURES von MEISENZAHL, ERIC, JOHN, DORAN, JAMES, E, SUMMA, JOSEPH, FABINSKI, ROBERT, PIERRE

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  16. 16
    MASK LAYER TRIM METHOD USING CHARGED PARTICLE BEAM EXPOSURE

    MASK LAYER TRIM METHOD USING CHARGED PARTICLE BEAM EXPOSURE von ZHOU LIN, SOLECKY ERIC PETER, DORAN JAMES E

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  17. 17
    SKI BOBS

    SKI BOBS von JAMES E. DORAN-WEBB

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  18. 18
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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  19. 19
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von MACHIA KEITH J, KNIGHT STEPHEN E, SHAVER JOSEPH E, SUNDLING DIANNE L, BOWLEY, JR. REGINALD R, CARLOS VINCENT J, LEIDY ROBERT K, DORAN JAMES E

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  20. 20
    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus

    Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus von Bowley, Jr, Reginald R, Carlos, Vincent J, Doran, James E, Knight, Stephen E, Leidy, Robert K, Machia, Keith J, Shaver, Joseph E, Sundling, Dianne L

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