Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy von Donnelly, V M

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Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature von Donnelly, V. M., Malyshev, M. V.

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Recombination Reactions of Oxygen Atoms on an Anodized Aluminum Plasma Reactor Wall, Studied by a Spinning Wall Method von Kurunczi, P. F, Guha, J, Donnelly, V. M

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Optical absorption and emission spectroscopy studies of ammonia-containing plasmas von Kang, S J, Donnelly, V M

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Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions von Malyshev, M. V., Donnelly, V. M.

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Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis von Fuller, N C M, Malyshev, M V, Donnelly, V M, Herman, Irving P

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Diagnostics of inductively coupled chlorine plasmas: Measurement of electron and total positive ion densities von Malyshev, M. V., Donnelly, V. M.

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Plasma-surface reactions at a spinning wall von Kurunczi, P F, Guha, J, Donnelly, V M

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Determination of electron temperature, atomic fluorine concentration, and gas temperature in inductively coupled fluorocarbon/rare gas plasmas using optical emission spectroscopy von Schabel, M. J., Donnelly, V. M., Kornblit, A., Tai, W. W.

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Dynamics of pulsed-power chlorine plasmas von Malyshev, M. V., Donnelly, V. M., Colonell, J. I., Samukawa, S.

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Dynamics of inductively-coupled pulsed chlorine plasmas in the presence of continuous substrate bias von Malyshev, M V, Donnelly, V M

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Critical review: Plasma-surface reactions and the spinning wall method von Donnelly, V. M., Guha, J., Stafford, L.

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Etching of high- k dielectric Zr1−xAlxOy films in chlorine-containing plasmas von Pelhos, K., Donnelly, V. M., Kornblit, A., Green, M. L., Van Dover, R. B., Manchanda, L., Hu, Y., Morris, M., Bower, E.

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Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing von Donnelly, V M, Malyshev, M V, Schabel, M, Kornblit, A, Tai, W, Herman, I P, Fuller, N C M

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Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl2 and Cl number densities von Malyshev, M. V., Donnelly, V. M.

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Electron energy distribution functions in low-pressure oxygen plasma columns sustained by propagating surface waves von Stafford, L., Khare, R., Donnelly, V. M., Margot, J., Moisan, M.

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On the constant composition and thickness of the chlorinated silicon surface layer subjected to increasing etching product concentrations during chlorine plasma etching von Bogart, K. H. A., Donnelly, V. M.

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The interface formation of copper and low dielectric constant fluoro-polymer: Plasma surface modification and its effect on copper diffusion von Du, M., Opila, R. L., Donnelly, V. M., Sapjeta, J., Boone, T.

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Percent dissociation of Cl2 in inductively coupled, chlorine-containing plasmas von Malyshev, M. V., Donnelly, V. M., Kornblit, A., Ciampa, N. A.

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Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage von Malyshev, M. V., Donnelly, V. M., Downey, S. W., Colonell, J. I., Layadi, N.

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