Non-reductive decyanation reactions of disubstituted malononitrile derivatives promoted by NaHMDS von Domon, Daisuke, Iwakura, Masaru, Tanino, Keiji

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Synthesis of the ABCDEF-ring of ciguatoxin 3C von Sato, Takuto, Fujiwara, Kenshu, Nogoshi, Keisuke, Goto, Akiyoshi, Domon, Daisuke, Kawamura, Natsumi, Nomura, Yoshitaka, Sato, Daisuke, Tanaka, Hideki, Murai, Akio, Kondo, Yoshihiko, Akiba, Uichi, Katoono, Ryo, Kawai, Hidetoshi, Suzuki, Takanori

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Synthesis of the C42–C52 part of ciguatoxin CTX3C von Domon, Daisuke, Fujiwara, Kenshu, Ohtaniuchi, Yuko, Takezawa, Akihiro, Takeda, Sayaka, Kawasaki, Hidekazu, Murai, Akio, Kawai, Hidethoshi, Suzuki, Takanori

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Synthesis of Seven-Membered Cross-Conjugated Cyclic Trienes by 8π Electrocyclic Reaction von Kato, Ranmaru, Saito, Hiroki, Uda, Shoko, Domon, Daisuke, Ikeuchi, Kazutada, Suzuki, Takahiro, Tanino, Keiji

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Convergent synthesis of the IJKLM-ring part of ciguatoxin CTX3C von Domon, Daisuke, Fujiwara, Kenshu, Murai, Akio, Kawai, Hidethoshi, Suzuki, Takanori

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An Ireland–Claisen rearrangement/RCM based approach for the construction of the EF-ring of ciguatoxin 3C von Nogoshi, Keisuke, Domon, Daisuke, Fujiwara, Kenshu, Kawamura, Natsumi, Katoono, Ryo, Kawai, Hidetoshi, Suzuki, Takanori

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A New Variant of Fused Cyclic Ether Synthesis Based on Ireland-Claisen Rearrangement and RCM von Domon, Daisuke, Fujiwara, Kenshu, Kawamura, Natsumi, Katoono, Ryo, Kawai, Hidetoshi, Suzuki, Takanori

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Resist composition and patterning process von Domon, Daisuke, Hatakeyama, Jun

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Polymer, negative resist composition, and pattern forming process von Domon, Daisuke, Hatakeyama, Jun

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RESIST COMPOSITION AND PATTERNING PROCESS von Domon, Daisuke, Hatakeyama, Jun

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RESIST COMPOSITION AND PATTERNING PROCESS von Domon, Daisuke, Hatakeyama, Jun

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Polymer, positive resist composition, and pattern forming process von Domon, Daisuke, Hatakeyama, Jun

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Onium salt, chemically amplified positive resist composition, and resist pattern forming process von Inoue, Naoya, Domon, Daisuke, Watanabe, Satoshi

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POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS von Hatakeyama Jun, Domon Daisuke

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POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS von Hatakeyama Jun, Domon Daisuke

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Onium salt, negative resist composition, and resist pattern forming process von Domon, Daisuke, Inoue, Naoya, Ohashi, Masaki, Masunaga, Keiichi, Kotake, Masaaki

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ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS von Inoue, Naoya, Domon, Daisuke, Watanabe, Satoshi

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POLYMERIZABLE MONOMERS von Domon, Daisuke, Watanabe, Satoshi

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Resist composition and resist patterning process von Domon, Daisuke, Suzuki, Takahiro, Masunaga, Keiichi, Watanabe, Satoshi, Kotake, Masaaki

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Sulfonium compound, positive resist composition, and resist pattern forming process von Inoue, Naoya, Domon, Daisuke, Ohashi, Masaki, Masunaga, Keiichi, Kotake, Masaaki

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